Particle-induced x-ray emission (PIXE) using hydrogen and multi-species focused ion beams
AssigneeFEI Company
InventorsDaniel Totonjian, Aurelien Philippe Jean Maclou Botman, Milos Toth
Life of this patent
Estimating the term…
Abstract
Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.
Claims28
An analytical method comprising:
- directing ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV);
- and
- detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.
A method of milling an area of a sample surface comprising:
- directing ions comprising a mixture of protons and non-hydrogen ions onto the area, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV), wherein the beam of ions is raster scanned across the area and wherein the impingement of the non-hydrogen ions causes sputtering of the sample surface within the area;
- and
- detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.
Dependencies are inferred from the claim text.