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US 12,060,293 B2Granted
Process for the preparation of synthetic quartz glass
AssigneeHeraeus Quarzglas GmbH & Co. KG
InventorsMartin Thürer, Walter Lehmann, Martin Trommer
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Abstract
Described is a method of producing synthetic fused silica in which the synthetic flame used in the method has a ratio of the Full Width at Half Maximum (FWHMvert) vertical luminous intensity to the Full Width at Half Maximum (FWHMhori) horizontal luminous intensity greater than 10 in a targetless state, the luminous intensities being measured in candela/mm2.
Claims7
A process for producing synthetic quartz glass, comprising:
- (1) evaporating a feedstock containing at least one organosilicon starting compound to form a feedstock vapor;
- (2) feeding the feedstock vapor from (1) to a reaction zone in which the feedstock vapor is burned in a flame in the presence of oxygen and is converted to SiO2 soot particles by oxidation or by hydrolysis;
- (3) depositing the SiO2 soot particles resulting from (2) on a deposition surface to form a soot body;
- and
- (4) if necessary, drying and vitrifying the soot body resulting from (3) to form synthetic fused silica;
- characterized in that the synthesis flame used in the process has a ratio of the Full Width at Half Maximum (FWHMvert) of the vertical luminous intensity to the Full Width at Half Maximum (FWHMhori) of the horizontal luminous intensity greater than 10 in a targetless state.
3 more elements
Dependencies are inferred from the claim text.