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US 12,059,698 B2Granted
Systems and methods of electron beam induced processing
AssigneeGeorgia Tech Research Corporation
InventorAndrei G. Fedorov
Life of this patent
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Abstract
Embodiments of the present disclosure provide for methods and systems for making structures using an electrospray system while under vacuum. In particular, embodiments of the present disclosure provide for methods and systems for ultra-fast growth of high aspect ratio nano/meso/micro-structures with three dimensional topological complexity and control of phase and composition of the structure formed.
Claims5
A system for forming a structure from a liquid film comprising:
- an electrospray system configured to direct a liquid onto a substrate to form the liquid film on the substrate, wherein the electrospray system includes an electrospray capillary tip is positioned about 1 mm to 10 mm away from the substrate, wherein an electric field of about 500 V/mm to 1500 V/mm relative to a ground electrode of the electrospray system is applied in order to induce electrospray, wherein the electrospray system includes an electrospray capillary tip, wherein the electrospray capillary tip has an orifice diameter of about 1 to 4 μm;
- an electron beam system for generating an electron beam, wherein the electron beam system is configured to direct the electron beam to a first area on the liquid film to form the structure,
- a compartment housing the substrate, wherein the compartment housing is under a vacuum, wherein the electrospray system is configured to deliver the liquid in the compartment housing under vacuum, wherein the electron beam is transmitted in the compartment housing under vacuum, and
- a cooling/heating system to control temperature of the substrate.
1 more element
Dependencies are inferred from the claim text.