Surface-emitting laser device and method for manufacturing surface-emitting laser device
AssigneesKyoto University, Stanley Electric Co., Ltd.
InventorsSusumu Noda, Tomoaki Koizumi, Kei Emoto
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AssigneesKyoto University, Stanley Electric Co., Ltd.
InventorsSusumu Noda, Tomoaki Koizumi, Kei Emoto
Estimating the term…
A method for manufacturing a GaN-based surface-emitting laser by an MOVPE includes: growing a first cladding layer with a {0001} growth plane; growing a guide layer on the first cladding layer; forming holes which are two-dimensionally periodically arranged within the guide layer; etching the guide layer by ICP-RIE using a chlorine-based gas and an argon; supplying a gas containing a nitrogen to cause mass-transport, and then supplying the group-III gas for growth, whereby a first embedding layer closing openings of the holes is formed to form a photonic crystal layer; and growing an active layer and a second cladding layer on the first embedding layer, The step includes a step of referring to already-obtained data on a relationship of an attraction voltage and a ratio of gases in the ICP-RIE with a diameter distribution of air holes embedded, and applying the attraction voltage and the ratio to the ICP-RIE.
A surface-emitting laser device made of a GaN-based semiconductor, comprising:
A surface-emitting laser device having a resonator layer and a semiconductor structure layer which constitutes a light emitting element, in which the surface-emitting laser device emits light in a direction orthogonal to the resonator layer and the semiconductor structure layer is made of hexagonal nitride semiconductor, comprising:
Dependencies are inferred from the claim text.