Back to results
US 12,049,528 B2Granted
Photopolymerizable block polymers and methods of producing and using the same
AssigneeAlign Technology, Inc.
InventorsUmesh Upendra Choudhary, Jessica Kalay Su, Michael Christopher Cole, Jennifer Marie Chavez
Life of this patent
Estimating the term…
Abstract
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.
Claims22
A photo-curable resin comprising:
- a telechelic polymer, the telechelic polymer comprising a polymer chain including, in a polymerized form, a first monomer and a reactive end functional group located at each terminus of the polymer chain;
- and
- a reactive diluent,
- wherein the first monomer comprises a first reactive functional group and has a vapor pressure from 2 Pa to 10 Pa at 60° C. in its monomeric state,
- wherein the following conditions are met:
- (i) following 2 h heating at 90° C., the first monomer has a mass loss rate of less than 0.25% per hour at 90° C. in its monomeric state;
- (ii) a number average molecular weight of the telechelic polymer is not more than 50 kDa;
- and
- (iii) the reactive end functional group and the first reactive functional group independently comprise a photopolymerizable moiety, and
- wherein the photo-curable resin is capable of being 3D printed to form an article.
7 more elements
Dependencies are inferred from the claim text.