Method for producing substrate with patterned film and fluorine-containing copolymer
AssigneeCentral Glass Company, Limited
InventorsYuzuru Kaneko, Takashi Aoki, Yusuke Nomura, Keiko Sasaki, Asuka Sano
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Abstract
The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.
Claims17
A method for producing a substrate with a patterned film, the method comprising:
- a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film comprising a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer, the fluorine-containing copolymer containing all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C);
- and
- a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, the formulas (A), (B), and (C) being:
- wherein R1, R2, and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms;
- Q is a C1-C20 fluoroalkyl group optionally containing a hydrogen atom, an oxygen atom, or a nitrogen atom;
- X and Y are each independently a single bond or a divalent group;
- Z is a bis(trifluoromethyl)vinyl group;
- O is an oxygen atom;
- and His a hydrogen atom.
A method for producing a substrate with a patterned film, the method comprising:
- a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film comprising a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer, the fluorine-containing copolymer containing all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C);
- and
- a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, the formulas (A), (B), and (C) being:
- wherein R1, R2 and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms;
- Q is a C3-C10 fluoroalkyl group and X is a carbonyl group;
- Y is a p-phenylene group, a p-phenylene carbonyl group, or a p-phenylene hexafluoroisopropylene group;
- Z is a bis(trifluoromethyl)vinyl group;
- O is an oxygen atom;
- and His a hydrogen atom.
A fluorine-containing copolymer comprising all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C):
- wherein R1, R2, and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms;
- Q is a C1-C20 fluoroalkyl group optionally containing a hydrogen atom, an oxygen atom, or a nitrogen atom;
- X and Y are each independently a single bond or a divalent group;
- Z is a bis(trifluoromethyl)vinyl group;
- O is an oxygen atom;
- and H is a hydrogen atom.
A fluorine-containing copolymer comprising all of a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), and a repeating unit represented by the following formula (C):
- wherein R1, R2 and R3 are each independently a hydrogen atom, a fluorine atom, or a C1-C20 alkyl group in which hydrogen atoms bonded to a carbon atom are optionally partly or entirely replaced by fluorine atoms;
- Q is a C3-C10 fluoroalkyl group and X is a carbonyl group;
- Y is a p-phenylene group, a p-phenylene carbonyl group, or a p-phenylene hexafluoroisopropylene group;
- Z is a bis(trifluoromethyl)vinyl group;
- O is an oxygen atom;
- and H is a hydrogen atom.
Dependencies are inferred from the claim text.