Method for manufacturing decorative member, and decorative member

A method for manufacturing a decoration element, the method comprising:

• depositing a light reflective layer having a structure of two or more islands separated from each other on one surface of a light absorbing layer;
• and
• dry etching the light absorbing layer using each of the two or more islands as a mask,
• wherein the depositing of the light reflective layer is conducted under a temperature condition of 10° C. to 100° C., without further heat treatment,
• wherein the dry etching is conducted for longer than or equal to 60 seconds and shorter than or equal to 300 seconds,
• wherein a resistance value of the decoration element after the dry etching of the light absorbing layer increases by two times or more compared to a resistance value of the decoration element before the dry etching of the light absorbing layer,
• wherein the mask is not removed after dry etching completed,
• wherein the light reflective layer consists of indium (In),
• wherein the depositing of the light reflective layer uses a sputtering method, and
• wherein, in the sputtering method:
• a shortest distance (d1) between the light absorbing layer and a sputter target is 200 mm or less, and electric power is applied for 10 seconds to 1,000 seconds under an electric power condition of 0.1 W/cm2 to 10 W/cm2 applied per a unit area of the sputter target;
• or
• a shortest distance (d2) between the light absorbing layer and a sputter target is greater than 200 mm, and electric power is applied for 10 seconds to 1,200 seconds under an electric power condition of 1 W/cm2 to 10 W/cm2 applied per a unit area of the sputter target.