Method and device for analyzing diffraction pattern of mixture, and information storage medium

A device for analyzing a diffraction pattern of a mixture, the device comprising:

• an observed pattern storage configured to store data of an observed pattern of X-ray diffraction;
• an analysis device configured to obtain a known target pattern and configured to obtain a fitting pattern by taking summation of a first term obtained by multiplying a known target pattern indicating a target component by a first intensity ratio, a second term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and an intensity of a temporary pattern, wherein the fitting pattern has the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters;
• and
• a fitting pattern storage configured to store data indicating the fitting pattern,
• wherein the analysis device is further configured to fit the fitting pattern is fitted to the observed pattern by changing the first intensity ratio and the second intensity ratio in a state where the unknown pattern is set to an initial pattern;
• and
• configured to fit the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first intensity ratio and the second intensity ratio after the fitting by changing the first intensity ratio and the second intensity ratio.

A computer-readable information storage medium having stored thereon a program for causing a computer to function as:

• an observed pattern storage configured to store data of an observed pattern of X-ray diffraction;
• an analysis device configured to obtain a known target pattern and configured to obtain a fitting pattern by taking summation of a first term obtained by multiplying a known target pattern indicating a target component by a first intensity ratio, a second term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and an intensity of a temporary pattern, wherein the fitting pattern has the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters;
• and
• a fitting pattern storage configured to store data indicating the fitting pattern,
• wherein the analysis device is further configured to fit the fitting pattern to the observed pattern by changing the first intensity ratio and the second intensity ratio in a state where the unknown pattern is set to an initial pattern;
• and configured to fit the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first intensity ratio and the second intensity ratio after the fitting by changing the first intensity ratio and the second intensity ratio.