Back to results
US 12,030,844 B2Granted
Compound and composition
AssigneeKao Corporation
InventorsShogo Kamenoue, Takashi Mizooku, Ryuya Arata, Akiyoshi Kimura
Life of this patent
Estimating the term…
Abstract
The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1). (In the formula, R1 and R2 are each a C1-C33 aliphatic hydrocarbon group, the total number of carbons of in R1 and R2 is 14-34, X is a single bond or a C1-C5 aliphatic hydrocarbon group, and A is —O—CH2—CH(OH)—CH2OH or —O—CH(—CH2—OH)2).
Claims20
A compound represented by a Chemical Formula (1):
- wherein R1 and R2 are each an aliphatic hydrocarbon group having 1 or more and 33 or less carbon atoms, a total number of carbon atoms of R1 and R2 is 14 or more and 34 or less, X is a single bond or an aliphatic hydrocarbon group having 1 or more and 5 or less carbon atoms, and A is —O—CH2—CH(OH)—CH2OH or —O—CH(—CH2—OH)2.
Dependencies are inferred from the claim text.