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US 12,025,917 B2Granted
System and method for supplying and dispensing bubble-free photolithography chemical solutions
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWen-Zhan Zhou, Heng-Jen Lee, Hsu-Yuan Liu, Yu-Chen Huang, Cheng-Han Wu, Shih-Che Wang, Ho-Yung David Hwang
Life of this patent
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Abstract
A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
Claims20
A method, comprising:
- providing a buffer tank having space bounding structures that define a container space, wherein one or more of the space bounding structures is moveable so that the container space has a variable volume;
- storing an initial volume of a chemical solution in the buffer tank, wherein the container space expands to accommodate the initial volume;
- pumping the chemical solution from the buffer tank, wherein the pumping removes at least some of the chemical solution from the buffer tank and the container space contracts as the chemical solution is removed;
- dispensing the pumped chemical solution onto a wafer;
- and
- in response to a determination that the buffer tank is in a low state:
- opening a valve between a supply container of the chemical solution and the container space;
- fully draining the supply container into the container space;
- and
- closing the valve;
- wherein the container space expands as it receives the chemical solution from the supply container.
8 more elements
A method, comprising:
- providing a buffer tank having a container space that changes shape to vary in volume as contents are added or removed from the container space, wherein a chemical solution is stored in the container space;
- pumping the chemical solution from the container space, wherein the pumping removes at least some of the chemical solution from the container space and thereby reduces the volume;
- and
- dispensing the pumped chemical solution onto a wafer;
- providing a supply container that is filled to capacity with the chemical solution;
- and
- draining the supply container into the container space, wherein draining the supply container into the container space causes the volume to expand by the capacity of the supply container;
- wherein fully draining the supply container into the container space comprises attaching a pressurized gas source to a head space of the supply container and using the pressurize gas to displace the chemical solution from the supply container.
5 more elements
A method, comprising:
- providing a buffer tank having a space bounding structures that define a container space, wherein one or more of the space bounding structures is moveable so that the container space has a variable volume, wherein an initial volume of a chemical solution is stored in the container space;
- using a bubble detector to detect bubbles in the container space,
- based on whether bubbles are detected in the container space, selectively opening a vent valve connected to the container space until bubbles are no longer detected in the container space;
- pumping the chemical solution from the buffer tank, wherein the pumping removes at least some of the chemical solution from the buffer tank and the container space contracts as the chemical solution is removed;
- and
- dispensing the pumped chemical solution onto a wafer;
- wherein the bubble detector uses ultrasound to detect the bubbles.
4 more elements
Dependencies are inferred from the claim text.