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AssigneeNissan Chemical Corporation
InventorsHirokazu Nishimaki, Daigo Saito, Ryo Karasawa, Keisuke Hashimoto
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A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1): [wherein R1 is a divalent group containing at least two amino groups and at least three C6-40 aromatic rings]. R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of a compound of the following Formula (2): R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of N,N′-diphenyl-1,4-phenylenediamine.
A resist underlayer film-forming composition comprising a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B), wherein the aromatic compound (A) is a novolac resin prepared by reaction of a compound having at least two amino groups and at least three C6-40 aromatic rings with an aldehyde or a ketone.
Dependencies are inferred from the claim text.