Structured light projection through the minimization of visual artifacts by way of deliberately introduced optical aberrations

A triangulation device for measuring a measurement object by a projection of a structured light pattern onto the measurement object, the triangulation device comprising:

• a projector configured to project the structured light pattern with projection light, the projection light comprising at least one wavelength λ, onto the measurement object, the structured light pattern being decomposable into different spatial frequencies, the projector comprising:
• a matrix of pixel elements, wherein an artifact pattern is defined by artifact regions between neighboring pixel elements, and
• a lens system, wherein the lens system is arranged so that the projection light passing through the lens system defines a wavefront with a wavefront aberration from a spherical reference wavefront;
• a camera comprising a lens system and an imaging sensor, wherein the camera is configured to receive the structured light pattern projected by the projector (8) onto the measurement object;
• and
• a processing unit configured to provide distance information by evaluating imaging information provided by the camera,
• wherein the wavefront aberration is defined by a primary spherical aberration coefficient Z9 of a Zernike decomposition, wherein Zernike polynomials defining the Zernike decomposition are ordered according to the Fringe Zernike coefficient ordering, wherein the primary spherical aberration coefficient Z9 is larger than one fourth of the wavelength λ.