MEMS microphone and preparation method therefor
AssigneeCsmc Technologies Fab2 Co., Ltd.
InventorsJiale Su, Guoping Zhou, Xinwei Zhang, Changfeng Xia
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AssigneeCsmc Technologies Fab2 Co., Ltd.
InventorsJiale Su, Guoping Zhou, Xinwei Zhang, Changfeng Xia
Estimating the term…
A preparation method for a micro-electromechanical systems (MEMS) microphone includes the steps of: providing a silicon substrate having a silicon surface; forming an enclosed cavity in the silicon substrate; forming a plurality of spaced apart acoustic holes in the silicon substrate, each acoustic hole having two openings, one of which communicating with the cavity and the other one located on the silicon surface; forming a sacrificial layer on the silicon substrate, which includes a first filling portion, a second filling portion and a shielding portion; forming a polysilicon layer on the shielding portion; forming a recess in the silicon substrate on the side away from the silicon surface; and removing the first filling portion, the second filling portion and part of the shielding portion so that the recess is brought into communication with the cavity to form a back chamber, and that the polysilicon layer, the remainder of the shielding portion and the silicon substrate together delimit a hollow chamber, the hollow chamber communicating with the opening of the plurality of acoustic holes away from the cavity, completing the MEMS microphone.
A preparation method for a micro-electromechanical systems (MEMS) microphone, comprising the steps of:
A micro-electromechanical systems (MEMS) microphone comprising a silicon substrate, a support member and a polysilicon layer, the silicon substrate having a silicon surface, the silicon substrate formed therein with a back chamber and a plurality of spaced apart acoustic holes, each of the plurality of acoustic holes having two openings, one of which located on the silicon surface of the silicon substrate and the other one communicating with the back chamber, the support member arranged on the silicon surface, the polysilicon layer disposed on the support member so as to be spaced apart from the silicon substrate so that the silicon substrate, the support member and the polysilicon layer together delimit a hollow chamber, the hollow chamber communicating with the opening of the plurality of acoustic holes away from the back chamber,
Dependencies are inferred from the claim text.