# US 12,015,070 B2 · Gate structure and method of forming the same

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- Number: US 12,015,070 B2
- Document ID: US12015070B2
- Status: Granted
- Kind: B2
- Application number: 17/814,175
- Filed: 2022-07-21
- Published: 2022-11-17
- Granted: 2024-06-18
- Earliest claimed: 2016-10-19
- Assignees: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicants: Taiwan Semiconductor Manufacturing Co., Ltd.
- Inventors: Yi-Chun Chen; Tsung Fan Yin; Li-Te Hsu; Ying Ting Hsia; Yi-Wei Chiu
- Web page: https://patentgrep.com/patent/US12015070B2

## CPC

- H10D 64/667: {the conductor comprising a layer of alloy material, compound material or organic material contacting the insulator, e.g. TiN workfunction layers (having lateral variation H10D64/671)}
- H10D 30/024: {of fin field-effect transistors [FinFET]}
- H10D 30/62: Fin field-effect transistors [FinFET]
- H10D 64/01318: {the conductor comprising a layer of alloy material, compound material or organic material contacting the insulator, e.g. TiN (comprising a layer of alloys of Si, Ge or C H10D64/01314)}
- H10D 64/017: {using dummy gates in processes wherein at least parts of the final gates are self-aligned to the dummy gates, i.e. replacement gate processes}
- H10D 64/669: {the conductor further comprising additional layers of alloy material, compound material or organic material, e.g. TaN/TiAlN}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

A method of forming a gate structure includes forming an opening through an insulating layer and forming a first work function metal layer in the opening. The method also includes recessing the first work function metal layer into the opening to form a recessed first work function metal layer, and forming a second work function metal layer in the opening and over the first work function metal layer. The second work function metal layer lines and overhangs the recessed first work function metal layer.

## Claims

### Claim 1

A structure comprising:
a first source/drain region and a second source/drain region in a substrate; and
a gate structure over the substrate and disposed between the first source/drain region and the second source/drain region, the gate structure comprising:
a gate dielectric;
a cap layer on the gate dielectric;
a gate electrode; and
a work function tuning structure between the gate dielectric and the gate electrode, the work function tuning structure having sidewalls separated by a first dimension distal the substrate and by a second dimension less than the first dimension proximal the substrate, wherein the work function tuning structure comprises:
a first work function tuning layer in contact with the cap layer;
a second work function tuning layer in contact with the first work function tuning layer and the cap layer; and
a third work function tuning layer in contact with the second work function tuning layer and the cap layer.

### Claim 2 (depends on 1)

The structure of claim 1, wherein the sidewalls of the work function tuning structure have stair-step increments.

### Claim 3 (depends on 1)

The structure of claim 1, wherein a surface of the work function tuning structure directed away from the substrate is recessed relative to the gate dielectric.

### Claim 4 (depends on 1)

The structure of claim 1, wherein the first dimension is between about 20 percent to about 50 percent greater than the second dimension.

### Claim 5 (depends on 1)

The structure of claim 1, further comprising an interfacial dielectric layer between the gate dielectric and the substrate, the interfacial dielectric layer having a first width equal to a second width of the gate dielectric.

### Claim 6 (depends on 5)

The structure of claim 5, further comprising a dielectric cap on the gate structure, wherein the dielectric cap has a third width equal to the first width and the second width.

### Claim 7 (depends on 6)

The structure of claim 6, wherein the dielectric cap is in contact with the gate dielectric, the cap layer, the gate electrode, and the third work function tuning layer.

### Claim 8

A semiconductor device comprising:
a semiconductor substrate;
a first source/drain region and a second source/drain region in the semiconductor substrate; and
a gate structure on the semiconductor substrate between the first source/drain region and the second source/drain region, the gate structure comprising:
a gate dielectric layer;
a cap layer lining the gate dielectric layer;
a first work function metal layer lining and contacting the cap layer; and
a second work function metal layer lining and contacting the first work function metal layer and the cap layer;
a third work function metal layer lining and contacting the second work function metal layer and the cap layer; and
a gate electrode lining and contacting the third work function metal layer.

### Claim 9 (depends on 8)

The semiconductor device of claim 8, further comprising a dielectric cap on the gate structure, the dielectric cap contacting the gate dielectric layer, the cap layer, the third work function metal layer, and the gate electrode.

### Claim 10 (depends on 9)

The semiconductor device of claim 9, further comprising a gate spacer on a sidewall of the gate structure, wherein an uppermost surface of the gate spacer is level with an uppermost surface of the dielectric cap, and wherein the uppermost surfaces of the gate spacer and the dielectric cap are above an uppermost surface of the gate structure.

### Claim 11 (depends on 10)

The semiconductor device of claim 10, wherein an uppermost surface of the second work function metal layer is separated from the uppermost surface of the dielectric cap by a first distance, wherein an uppermost surface of the third work function metal layer is separated from the uppermost surface of the dielectric cap by a second distance, and wherein the second distance is 5 percent to 50 percent less than the first distance.

### Claim 12 (depends on 10)

The semiconductor device of claim 10, wherein an uppermost surface of the second work function metal layer is separated from the uppermost surface of the dielectric cap by a first distance, wherein an uppermost surface of the first work function metal layer is separated from the uppermost surface of the dielectric cap by a second distance, and wherein the first distance is 5 percent to 50 percent less than the second distance.

### Claim 13 (depends on 9)

The semiconductor device of claim 9, wherein the cap layer comprises a first cap sub-layer lining and contacting the gate dielectric layer and a second cap sub-layer lining and contacting the first cap sub-layer, wherein uppermost surfaces of the gate dielectric layer, the first cap sub-layer, the second cap sub-layer, the third work function metal layer, and the gate electrode are level with one another.

### Claim 14 (depends on 8)

The semiconductor device of claim 8, wherein the first work function metal layer comprises titanium, titanium aluminum, tantalum carbide, titanium aluminum nitride, tantalum carbo-nitride, or tantalum silicon nitride, wherein the second work function metal layer comprises titanium nitride, and wherein the third work function metal layer comprises titanium nitride.

### Claim 15

A semiconductor device comprising:
a first source/drain region and a second source/drain region in a substrate; and
a gate structure over the substrate and disposed between the first source/drain region and the second source/drain region, the gate structure comprising:
a gate dielectric;
a cap layer lining the gate dielectric;
a gate electrode;
a work function tuning structure disposed between the gate dielectric and the gate electrode, the work function tuning structure comprising:
a first work function layer lining and contacting the cap layer; and
a second work function layer lining and contacting the first work function layer and the cap layer;
a gate spacer on a sidewall of the gate structure; and
a dielectric cap on the gate structure, wherein a first uppermost surface of the gate spacer is level with a second uppermost surface of the dielectric cap, and wherein the first uppermost surface and the second uppermost surface are above a third uppermost surface of the gate structure.

### Claim 16 (depends on 15)

The semiconductor device of claim 15, wherein the work function tuning structure further comprises a third work function layer lining and contacting the second work function layer and the cap layer.

### Claim 17 (depends on 16)

The semiconductor device of claim 16, wherein the dielectric cap contacts the gate dielectric, the cap layer, the gate electrode, and the third work function layer.

### Claim 18 (depends on 16)

The semiconductor device of claim 16, wherein an uppermost surface of the second work function layer is separated from the uppermost surface of the dielectric cap by a first distance, wherein an uppermost surface of the third work function layer is separated from the uppermost surface of the dielectric cap by a second distance, and wherein the second distance is 5 percent to 50 percent less than the first distance.

### Claim 19 (depends on 15)

The semiconductor device of claim 15, wherein an uppermost surface of the second work function layer is separated from the uppermost surface of the dielectric cap by a first distance, wherein an uppermost surface of the first work function layer is separated from the uppermost surface of the dielectric cap by a second distance, and wherein the first distance is 5 percent to 50 percent less than the second distance.

### Claim 20 (depends on 15)

The semiconductor device of claim 15, further comprising:
an etch stop layer on the first source/drain region, the second source/drain region, and the gate structure; and
an interlayer dielectric on the etch stop layer, wherein a fourth uppermost surface of the etch stop layer and a fifth uppermost surface of the interlayer dielectric are level with the first uppermost surface and the second uppermost surface.