Salt, acid generator, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsMasahiko Shimada, Koji Ichikawa
Life of this patent
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AssigneeSumitomo Chemical Company, Limited
InventorsMasahiko Shimada, Koji Ichikawa
Estimating the term…
Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X0 represents *—CO—O—, *—O—CO—, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X1 represents an oxygen atom or a sulfur atom; R1 represents a halogen atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z+ represents an organic cation.
A salt represented by formula (I):
A salt represented by formula (I):
A resist composition comprising an acid generator comprising a salt represented by formula (I), and a resin having an acid-labile group:
Dependencies are inferred from the claim text.