# US 12,010,892 B2 · Display panel and manufacturing method thereof

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- Number: US 12,010,892 B2
- Document ID: US12010892B2
- Status: Granted
- Kind: B2
- Application number: 16/966,074
- Filed: 2019-12-30
- Published: 2023-08-03
- Granted: 2024-06-11
- Earliest claimed: 2019-12-20
- Assignees: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicants: Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Inventors: Lei Wang
- Web page: https://patentgrep.com/patent/US12010892B2

## CPC

- H10K 59/38: comprising colour filters or colour changing media [CCM]
- H10K 59/1201: {Manufacture or treatment}
- H10K 59/35: comprising red-green-blue [RGB] subpixels
- H10K 59/40: OLEDs integrated with touch screens
- H10K 59/8792: {comprising light absorbing layers, e.g. black layers}
- H10K 71/00: Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

The present disclosure provides a display panel and a manufacturing method thereof. The display panel includes a thin-film transistor structure layer, an OLED light-emitting layer disposed on the thin-film transistor structure layer and including light-emitting color sub-pixels arranged at intervals, a touch layer disposed on the OLED light-emitting layer, and a color filter including color film layers disposed on the light-emitting color sub-pixels and a color resist layer located among the color film layers.

## Claims

### Claim 1

A display panel, comprising:
a thin-film transistor structure layer;
an organic light emitting diode (OLED) light-emitting layer disposed on the thin-film transistor structure layer, wherein the OLED light-emitting layer includes a first light-emitting color sub-pixel, a second light-emitting color sub-pixel, and a third light-emitting color sub-pixel that are arranged at intervals;
a touch layer disposed on the OLED light-emitting layer; and
a color filter including a first color film layer disposed on the first light-emitting color sub-pixel, and a color resist layer located near the first color film layer;
wherein the color resist layer includes the first color film layer disposed on the touch layer;
wherein the touch layer includes:
a planarization layer disposed on a side of an array substrate facing the color filter;
a first metal layer disposed on the planarization layer and including a first metal electrode been patterned;
an insulating layer disposed on the planarization layer and covering the first metal layer, wherein the first color film layer and the insulating layer are provided in a same layer; and
a second metal layer disposed on the insulating layer and including a second metal electrode been patterned, wherein the second metal electrode is connected to the first metal electrode, and the color resist layer is disposed on the second metal electrode;
wherein the display panel further includes an opening penetrating from a surface of the color resist layer to a surface of the first color film layer;
wherein the color filter further includes a protective layer filled in the opening and covering the color resist layer.

### Claim 2 (depends on 1)

The display panel according to claim 1, wherein the protective layer is an organic protective glue.

### Claim 3 (depends on 1)

The display panel according to claim 1, wherein the first color film layer is one of a red color resist layer, a green color resist layer, and a blue color resist layer.

### Claim 4 (depends on 3)

The display panel according to claim 3, wherein a thickness of each of the red color resist layer, the green color resist layer, and the blue color resist layer is 2 μm, and a light transmittance of the color resist layer is less than 0.5%.

### Claim 5 (depends on 1)

A display device, comprising the display panel according to claim 1.

### Claim 6 (depends on 5)

The display device according to claim 5, wherein the protective layer is an organic protective glue.

### Claim 7 (depends on 5)

The display device according to claim 5, wherein the first color film layer is one of a red color resist layer, a green color resist layer, and a blue color resist layer.

### Claim 8 (depends on 7)

The display device according to claim 7, wherein a thickness of each of the red color resist layer, the green color resist layer, and the blue color resist layer is 2 μm, and a light transmittance of the color resist layer is less than 0.5%.

### Claim 9

A manufacturing method for manufacturing a display panel, wherein the manufacturing method comprises steps of:
providing a thin-film transistor structure layer;
disposing an organic light emitting diode (OLED) light-emitting layer on the thin-film transistor structure layer;
forming a touch layer on the OLED light-emitting layer; and
disposing a color filter on the touch layer, wherein a color resist layer is formed on the touch layer;
wherein the step of forming the touch layer includes:
depositing silicon nitride material to form a planarization layer on an array substrate;
depositing a metal material to form a first metal layer including a first metal electrode on the planarization layer;
depositing a silicon nitride material to form an insulating layer on the first metal layer, and forming a through hole of the insulating layer penetrating the insulating layer; and
depositing a metal material on the insulating layer, and forming a second metal layer including a second metal electrode in the through hole, wherein the second metal electrode is connected to the first metal electrode through the through hole;
wherein in the step of disposing the color filter, the color resist layer is formed by:
depositing a red color resist material on the touch layer to form a red color resist layer;
depositing a green color resist material on the red color resist layer to form a green color resist layer; and
depositing a blue color resist material on the green color resist layer to form a blue color resist layer;
wherein after forming the color resist layer, further including:
providing a mask to place above the color resist layer, wherein the mask includes holes, a photoresist is coated on the mask and the color resist layer corresponding to the holes, and the color resist layer corresponding to the holes is removed to form a first hole penetrating the color resist layer;
etching the second metal layer in the first hole and removing the insulating layer corresponding to the first hole to form a second hole, wherein the first hole and the second hole commonly form an opening;
depositing a color resist material in the opening to form a first color film layer, wherein the first color film is provided in a same layer as the insulating layer; and
filling an organic protective glue in the opening and covering the color resist layer to form a protective layer.