# US 12,009,371 B2 · Display device with transparent electric insulating heat conductive protective layer and production method thereof

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- Number: US 12,009,371 B2
- Document ID: US12009371B2
- Status: Granted
- Kind: B2
- Application number: 17/263,612
- Filed: 2020-06-04
- Published: 2021-09-23
- Granted: 2024-06-11
- Earliest claimed: 2019-06-13
- Assignees: Hefei BOE Joint Technology Co., Ltd.; Boe Technology Group Co., Ltd.
- Applicants: Hefei BOE Joint Technology Co., Ltd.; Boe Technology Group Co., Ltd.
- Inventors: Lifang Song
- Web page: https://patentgrep.com/patent/US12009371B2

## CPC

- H10P 14/69215: {the material being a silicon oxide, e.g. SiO2}
- H10D 86/021: {of multiple TFTs}
- H10D 86/451: {characterised by the compositions or shapes of the interlayer dielectrics}
- H10D 86/60: wherein the TFTs are in active matrices
- H10H 29/142: {Two-dimensional arrangements, e.g. asymmetric LED layout}
- H10K 59/124: Insulating layers formed between TFT elements and OLED elements
- H10K 59/8794: {Arrangements for heating and cooling}
- H10P 14/6342: {Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating}
- H10P 14/6686: {the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane}
- H10K 59/1201: {Manufacture or treatment}
- H10K 59/38: comprising colour filters or colour changing media [CCM]
- H10K 2102/331: {Nanoparticles used in non-emissive layers, e.g. in packaging layer}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10H: INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A display apparatus (1) and a preparation method therefor. The display apparatus (1) is provided with: a base substrate (10); an organic planarizing layer (20) located on the base substrate (10); a transparent insulation heat-conduction protection layer (30) located at a side, away from the base substrate (10), of the organic planarizing layer (20); and a light-emitting element located at a side, away from the base substrate (10), of the transparent insulation-heat conduction-protection layer (30), wherein an orthographic projection, on the base substrate (10), of the light-emitting element at least partially overlaps with an orthographic projection, on the base substrate (10), of the transparent insulation heat-conduction protection layer (30).

## Claims

### Claim 1

A production method for a display device, wherein the production method comprises
providing a base substrate;
covering the base substrate with an organic planarization layer;
covering a side of the organic planarization layer away from the base substrate with a transparent electric insulating heat conductive protective layer against deformation due to sputtering; and
forming a light-emitting element at a side of the transparent electric insulating heat conductive protective layer against deformation due to sputtering away from the base substrate;
wherein an orthographic projection of the light-emitting element on the base substrate and an orthographic projection of the transparent electric insulating heat conductive protective layer against deformation due to sputtering on the base substrate at least partially overlap,
wherein said covering a side of the organic planarization layer away from the base substrate with a transparent electric insulating heat conductive protective layer against deformation due to sputtering comprises:
producing a silica sol;
applying the silica sol on a side of the organic planarization layer away from the base substrate;
heating and curing the silica sol, so as to obtain a nano silica thin film layer,
wherein said producing a silica sol comprises
mixing ethyl orthosilicate with a solvent, then adding a basic catalyst and performing stirring;
adding N, N-dimethyl formamide, and obtaining the silica sol after stirring,
wherein the basic catalyst comprises a mixture of ammonia and water with a molar ratio of 0.001-0.002,
wherein a volume fraction of the N, N-dimethyl formamide in the silica sol is 25%-35%.

### Claim 2 (depends on 1)

The production method according to claim 1, wherein an orthographic projection of the light-emitting element on the base substrate is within an orthographic projection of the transparent electric insulating heat conductive protective layer against deformation due to sputtering on the base substrate.

### Claim 3 (depends on 1)

The production method according to claim 1, wherein the solvent comprises at least one of ethanol, ethoxyethanol, and isopropanol.