# US 12,009,233 B2 · Imprint lithography methods comprising multiple printheads configured to generate a fluid droplet pattern with a drop exclusion zone

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 12,009,233 B2
- Document ID: US12009233B2
- Status: Granted
- Kind: B2
- Application number: 17/452,277
- Filed: 2021-10-26
- Published: 2022-02-10
- Granted: 2024-06-11
- Earliest claimed: 2017-11-06
- Assignees: Canon Kabushiki Kaisha
- Applicants: Canon Kabushiki Kaisha
- Inventors: Amir Tavakkoli Kermani Ghariehali; Edward Brian Fletcher
- Web page: https://patentgrep.com/patent/US12009233B2

## CPC

- H10P 72/0448: {Apparatus for applying a liquid, a resin, an ink or the like}
- B41J 2/005: characterised by bringing liquid or particles selectively into contact with a printing material (printing by selective application of impact or pressure on a printing or impression-transfer material B41J2/22)
- B41J 2/2132: {Print quality control characterised by dot disposition, e.g. for reducing white stripes or banding (methods for local corrections by dot omission, image edge enhancement, or multi-pass mask selection G06K15/102; colour conversion H04N1/40)}
- B41M 3/006: {Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B41J: TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41M: PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING, (correction of typographical errors B41J; processes for applying transfer pictures or the like B44C1/16; fluid media for correction of typographical errors by coating C09D10/00; printing textiles D06P)
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has a side and a drop exclusion zone along the side, and the drop exclusion zone is narrower at a first point farther from the center of a side and wider at a second point closer to the center of the side. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications.

## Claims

### Claim 1

An imprint lithography method, the method comprising:
generating a fluid droplet pattern of fluid droplets of a formable material to be dispensed in rows onto a substrate, wherein the fluid droplet pattern includes an imprint field, wherein:
the imprint field has a side and a drop exclusion zone along the side; and
the drop exclusion zone is narrower at a first point farther from a center of the side and wider at a second point closer to the center of the side;
rotating a first fluid dispenser in a first rotational direction with respect to the side of the imprint field and a second fluid dispenser in a second rotational direction with respect to the side of the imprint field, wherein the first rotational direction is different from the second rotational direction; and
dispensing fluid droplets of the formable material from the first fluid dispenser and the second fluid dispenser onto the substrate corresponding to the fluid droplet pattern, wherein the drop exclusion zone is defined by the side of the imprint field and a line passing through centers of fluid droplets that are closest to the side.

### Claim 2 (depends on 1)

The method of claim 1, wherein dispensing the fluid droplets of the formable material is performed during a single pass using the first fluid dispenser and the second fluid dispenser that are in different rotational positions with respect to each other.

### Claim 3 (depends on 1)

The method of claim 1, wherein dispensing the fluid droplets of the formable material comprises:
dispensing a first set of fluid droplets using one of the first and the second fluid dispenser during a first pass;
rotating the fluid dispenser, the substrate, or both; and
dispensing a second set of the fluid droplets using the fluid dispenser during a second pass.

### Claim 4 (depends on 1)

The method of claim 1, wherein dispensing the fluid droplets of the formable material comprises:
dispensing a first set of the fluid droplets using the first fluid dispenser and a second set of fluid droplets using the second fluid dispenser during a pass; and
rotating the first fluid dispenser, the second fluid dispenser, the substrate or any combination during the pass.

### Claim 5 (depends on 1)

The method of claim 1, further comprising providing an apparatus having a fluid dispense system that includes the first fluid dispenser and the second fluid dispenser, wherein:
the first fluid dispenser and the second fluid dispenser are oriented along adjacent sides of the imprint field before dispensing the fluid droplets;
the first fluid dispenser has a length that lies along a first line;
the second fluid dispenser has a length that lies along a second line; and
the first and second lines intersect at an angle other than 90°.

### Claim 6 (depends on 5)

The method of claim 5, wherein dispensing the fluid droplets of the formable material comprises:
dispensing a first set of the fluid droplets using the first fluid dispenser; and
dispensing a second set of the fluid droplets using the second fluid dispenser.

### Claim 7 (depends on 1)

The method of claim 1, wherein generating the fluid droplet pattern is performed such that, wherein on an intra-row basis, fluid droplets from each of first and second passes or different fluid dispensers along a row has a predetermined local volume of the formable material.

### Claim 8 (depends on 7)

The method of claim 7, wherein the fluid droplets from the first and second passes meet at a junction that is spaced apart from a central portion of the imprint field.

### Claim 9

A method of manufacturing an article, the method comprising:
providing a fluid dispense system having
a first fluid dispenser having first fluid dispense ports and a second fluid dispenser having second fluid dispense ports
the first fluid dispenser and the second fluid dispenser are oriented along adjacent sides of the imprint field before dispensing the fluid droplets, wherein the first fluid dispenser and the second fluid dispenser are in different rotational positions with respect to each other;
generating a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate, wherein the fluid droplet pattern includes an imprint field, wherein:
the imprint field has a side and a drop exclusion zone along the side; and
the drop exclusion zone is narrower at a first point farther from a center of the side and wider at a second point closer to the center of the side; and
moving a substrate of the article and the first and second fluid dispense ports relative to each other;
dispensing fluid droplets of the formable material onto the substrate corresponding to the fluid droplet pattern, wherein the drop exclusion zone is defined by the side of the imprint field and a line passing through centers of fluid droplets that are closest to the side;
contacting the formable material with a template having a patterned surface; and
curing the formable material to form a patterned layer corresponding to the patterned surface of the template.

### Claim 10 (depends on 9)

The method of claim 9, wherein the article includes an electronic device, and the substrate includes a semiconductor wafer.