System for coupling RF power into LINACs and bellows coating by magnetron sputtering with kick pulse

A method, carried out by a system, for depositing high-quality films for providing a nanolayered coating on a three-dimensional surface, wherein the system comprises:

• a magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along a sputter target;
• and
• an elongated sputtering electrode material tube surrounding the magnetic array comprising multiple sets of magnets arranged to have Hall-Effect regions that run lengthwise along the sputter target, and
• wherein the method for comprises nanolayering a surface of a three-dimensional surface by generating and controlling ion flux for direct current high-power impulse magnetron sputtering, and
• wherein the nanolayering a surface comprises:
• providing a vacuum apparatus containing a sputtering magnetron target electrode;
• generating a high-power pulsed plasma magnetron discharge with a high-current negative direct current (DC) pulse to the sputtering magnetron target electrode;
• and
• generating a configurable sustained positive voltage kick pulse to the sputtering magnetron target electrode after terminating the negative DC pulse,
• wherein during the generating, program processor configured logic circuitry issues a control signal to control at least one kick pulse property of the sustained positive voltage kick pulse taken from the group consisting of:
• onset delay, duration, amplitude and frequency including modulation thereof, and
• wherein, during the nanolayering, a distance (L) between the sputtering magnetron target electrode and a receiving surface of the three-dimensional surface is a distance such that the system operates in an abnormal or obstructed glow discharge regime.