# US 12,009,188 B2 · Rotatable faraday cleaning apparatus and plasma processing system

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- Number: US 12,009,188 B2
- Document ID: US12009188B2
- Status: Granted
- Kind: B2
- Application number: 17/626,496
- Filed: 2020-02-28
- Published: 2022-09-22
- Granted: 2024-06-11
- Earliest claimed: 2019-12-31
- Assignees: Jiangsu Leuven Instruments Co. Ltd
- Applicants: Jiangsu Leuven Instruments Co., Ltd
- Inventors: Haiyang Liu; Dongdong Hu; Xiaobo Liu; Na Li; Shiran Cheng; Song Guo; Zhihao Wu; Kaidong Xu
- Web page: https://patentgrep.com/patent/US12009188B2

## CPC

- H01J 37/32862: {In situ cleaning of vessels and/or internal parts}
- B08B 1/165: {Scrapers}
- B08B 1/36: rotating about an axis orthogonal to the surface
- B08B 9/00: Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B 13/00: Accessories or details of general applicability for machines or apparatus for cleaning
- H01J 2237/334: Etching
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL

## Abstract

The present invention provides a rotatable faraday cleaning apparatus and a plasma processing system, said apparatus comprising a cavity cover, a motor, an eccentric wheel, a long-petalled assembly, a coupling window, a gas intake nozzle, a connecting rod, a short-petalled assembly, a first sector-shaped conductor, and a second sector-shaped conductor; the cavity cover is assembled on a reactor cavity main body, the coupling window is mounted on the cavity cover, the gas intake nozzle is provided on the coupling window, the first sector-shaped conductor is assembled on the gas intake nozzle, the second sector-shaped conductor is assembled on the gas intake nozzle, the long-petalled assembly is assembled on the gas intake nozzle, the short-petalled assembly is assembled on the gas intake nozzle, the connecting rod is assembled on the long-petalled assembly, the eccentric wheel is assembled on the connecting rod, and the motor is mounted on the eccentric wheel.

## Claims

### Claim 1

A rotatable faraday cleaning apparatus for a plasma processing system, comprising:
a reactor cavity main body;
a bias electrode mounted at a lower side inside the reactor cavity main body; and
a rotatable cleaning mechanism disposed at an upper side above the reactor cavity main body,
wherein the rotatable cleaning mechanism comprises:
a cavity cover assembled at the upper side above the reactor cavity main body,
a coupling window mounted at an upper side of the cavity cover,
a gas intake nozzle provided at a central part of the coupling window,
a long-petalled assembly and a short-petalled assembly assembled at an outer side of the gas intake nozzle,
a first sector-shaped conductor and a second sector-shaped conductor assembled at the outer side of the gas intake nozzle,
a connecting rod assembled at a left side of the long-petalled assembly,
an eccentric wheel assembled at a front side of the connecting rod, and
a motor mounted at an upper side of the eccentric wheel.

### Claim 2 (depends on 1)

The rotatable faraday cleaning apparatus for the plasma processing system according to claim 1, wherein a rotating shaft is assembled on an annular side surface of the gas intake nozzle, and inner sides of the long-petalled assembly and the short-petalled assembly are connected to the rotating shaft.

### Claim 3 (depends on 1)

The rotatable faraday cleaning apparatus for the plasma processing system according to claim 1, wherein hinges are assembled on the front side and a rear side of the connecting rod, the front side of the connecting rod is connected to the eccentric wheel by a first hinge of the hinges, and the rear side of the connecting rod is connected to the long-petalled assembly by a second hinge of the hinges.

### Claim 4 (depends on 1)

The rotatable faraday cleaning apparatus for the plasma processing system according to claim 1, wherein the bias electrode, the first sector-shaped conductor, the second sector-shaped conductor, and the motor are all connected to an external power supply through wires.

### Claim 5 (depends on 1)

The rotatable faraday cleaning apparatus for the plasma processing system according to claim 1, wherein a number of the long-petalled assemblies is four, all the long-petalled assemblies have a same specification, and a number of the short-petalled assemblies is four, all the short-petalled assemblies have a same specification, and the four long-petalled assemblies and the four short-petalled assemblies are evenly distributed at the outer side of the gas intake nozzle.

### Claim 6 (depends on 1)

The rotatable faraday cleaning apparatus for the plasma processing system according to claim 1, wherein a sealing cover is assembled at an upper side of the cavity cover, and a rubber gasket is assembled at a lower side of the sealing cover.