# US 12,007,699 B2 · Vessel for a radiation source > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,007,699 B2 - Document ID: US12007699B2 - Status: Granted - Kind: B2 - Application number: 17/787,235 - Filed: 2020-11-13 - Published: 2023-01-26 - Granted: 2024-06-11 - Earliest claimed: 2019-12-17 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Sander Kerssemakers; Robert Gabriël Maria Lansbergen; Martinus Hendrikus Antonius Leenders; Henricus Gerardus Tegenbosch - Web page: https://patentgrep.com/patent/US12007699B2 ## CPC - G03F 7/70841: {Constructional issues related to vacuum environment, e.g. load-lock chamber} - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - G03F 7/70808: {Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus} - G03F 7/70925: {Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning} - G03F 7/70975: {Assembly, maintenance, transport or storage of apparatus} - H05G 2/0086: {Optical arrangements for conveying the laser beam to the plasma generation location} - H05G 2/0094: {Reduction, prevention or protection from contamination; Cleaning} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) ## Abstract A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening. ## Claims ### Claim 1 A vessel configured to house an EUV radiation source system, the vessel comprising: a first opening configured to allow a user to access the radiation source system in an interior of the vessel; a first access member configured to allow or prevent access to the interior of the vessel through the first opening; a second opening configured to allow the user to access a radiation source system in the interior of the vessel, wherein the second opening is configured in the first access member; and a second access member located on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening. ### Claim 2 (depends on 1) The vessel of claim 1, wherein the first opening is configured to allow access to a first component and a second component of the radiation source system and to allow passage of the first and/or second components of the radiation source system through the first opening, wherein the first and/or second component comprise a debris mitigation system, an optical component, a metrology module, and/or an inspection apparatus. ### Claim 3 (depends on 2) The vessel of claim 2, wherein the second opening is configured to allow access to the second component of the radiation source system and to allow passage of the second component of the radiation source system through the second opening, wherein the second component comprises a debris mitigation system, an optical component, a metrology module, and/or an inspection apparatus. ### Claim 4 (depends on 1) The vessel of claim 1, wherein the vessel is operable between at least two of a closed configuration, a first open configuration, and a second open configuration. ### Claim 5 (depends on 4) The vessel of claim 4, wherein: in the closed configuration of the vessel, the first and second access members are configured to prevent access to the interior of the vessel, in the first open configuration of the vessel, the first access member is configured to allow access to the interior of the vessel through the first opening, and/or in the second open configuration of the vessel, the second access member is configured to allow access to the interior of the vessel through the second opening. ### Claim 6 (depends on 1) The vessel of claim 1, wherein the vessel comprises a mounting portion for mounting one or more metrology modules or inspection apparatuses to the vessel, the mounting portion being part of or comprised in the first access member. ### Claim 7 (depends on 6) The vessel of claim 6, wherein the mounting portion is configured to mount the one or more metrology modules or inspection apparatuses relative to a reference point in the interior of the vessel. ### Claim 8 (depends on 6) The vessel of claim 6, wherein the second access member is configured separately from the mounting portion and/or below the mounting portion. ### Claim 9 An EUV radiation source comprising: a vessel configured to house an EUV radiation source system, the vessel comprising: a first opening configured to allow a user to access an interior of the vessel; a first access member configured to allow or prevent access to the interior of the vessel through the first opening; a second opening configured to allow the user to access the interior of the vessel, wherein the second opening is configured in the first access member; and a second access member located on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening. ### Claim 10 (depends on 9) The radiation source of claim 9, wherein the radiation source system comprises a debris mitigation system, the debris mitigation system being configured to be modular. ### Claim 11 (depends on 10) The radiation source of claim 10, wherein a first component of the radiation source system comprises at least a part or all of the debris mitigation system of the radiation source. ### Claim 12 (depends on 9) The radiation source of claim 9, wherein a second component of the radiation source system comprises at least one of: a collector mirror configured for collecting radiation emitted at a plasma formation region of the radiation source; and a fuel collector configured for collecting fuel debris generated at the plasma formation region of the radiation source. ### Claim 13 A lithographic system comprising: an EUV radiation source comprising: a vessel configured to house an EUV radiation source system, the vessel comprising: a first opening configured to allow a user to access an interior of the vessel; a first access member configured to allow or prevent access to the interior of the vessel through the first opening; a second opening configured to allow the user to access the interior of the vessel, wherein the second opening is configured in the first access member; and a second access member located on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening; and a lithographic apparatus. ### Claim 14 A method comprising: exchanging at least a first component of an EUV radiation source, the radiation source comprising a vessel for housing an EUV radiation source system, the vessel comprising: a first opening for accessing an interior of the vessel; a first access member configured to allow or prevent access to the interior of the vessel through the first opening; a second opening for accessing the interior of the vessel, wherein the second opening is configured in the first access member; and a second access member located on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening; operating the first access member to allow access to the interior of the vessel through the first opening; removing at least the first component to be exchanged; installing at least another first component to be used; and operating the first access member to prevent access to the interior of the vessel through the first opening. ### Claim 15 A method comprising: exchanging a second component of an EUV radiation source, the radiation source comprising a vessel for housing an EUV radiation source system, the vessel comprising: a first opening for accessing an interior of the vessel; a first access member configured to allow or prevent access to the interior of the vessel through the first opening; a second opening for accessing the interior of the vessel, wherein the second opening is configured in the first access member; and a second access member located on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening; operating the second access member to allow access to the interior of the vessel through the second opening; removing the second component to be exchanged; installing another second component to be used; and operating the second access member to prevent access to the interior of the vessel through the second opening.