# US 12,007,688 B2 · Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,007,688 B2 - Document ID: US12007688B2 - Status: Granted - Kind: B2 - Application number: 16/953,305 - Filed: 2020-11-19 - Published: 2021-03-11 - Granted: 2024-06-11 - Earliest claimed: 2018-07-06 - Assignees: FUJIFILM Corporation - Applicants: FUJIFILM Corporation - Inventors: Daisuke Asakawa; Akiyoshi Goto; Masafumi Kojima; Takashi Kawashima; Yasufumi Oishi; Keita Kato - Web page: https://patentgrep.com/patent/US12007688B2 ## CPC - G03F 7/039: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) - G03F 7/11: having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} - C08F 20/18: with acrylic or methacrylic acids - C08F 26/06: by a heterocyclic ring containing nitrogen - C08F 220/1807: {C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate} - C08F 220/1808: {C8-(meth)acrylate, e.g. isooctyl (meth)acrylate or 2-ethylhexyl (meth)acrylate} - C08F 220/24: containing perhaloalkyl radicals - C08F 220/282: {and containing two or more oxygen atoms} - C08F 220/30: containing aromatic rings in the alcohol moiety - C08F 226/06: by a heterocyclic ring containing nitrogen - C09D 125/18: Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen - C09D 133/06: of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical - G03F 7/0046: {with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence)} - G03F 7/038: Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) - G03F 7/0392: {the macromolecular compound being present in a chemically amplified positive photoresist composition} - G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS - C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D) ## Abstract An actinic ray-sensitive or radiation-sensitive resin composition includes a resin including a repeating unit represented by Formula (1) and capable of increasing a polarity by an action of an acid. ## Claims ### Claim 1 An actinic ray-sensitive or radiation-sensitive resin composition comprising a resin including a repeating unit represented by General Formula (1) and capable of increasing a polarity by an action of an acid, in General Formula (1), X represents —SO2—, —SO—, or —CS—, Y represents a divalent linking group, R1 represents a monovalent organic group, and R2 to R5 each independently represent a hydrogen atom or a monovalent organic group. ### Claim 2 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein the resin is a resin including the repeating unit represented by General Formula (1) and a repeating unit having an acid-decomposable group, or a resin including the repeating unit represented by General Formula (1) where R1 represents a monovalent organic group including an acid-decomposable group. ### Claim 3 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein Y represents a substituted or unsubstituted alkylene group, —CO—, —SO2—, —SO—, or —CS—. ### Claim 4 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein R1 represents a substituted or unsubstituted hydrocarbon group including a heteroatom. ### Claim 5 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein R1 represents a substituted or unsubstituted hydrocarbon group which includes a cyclic structure including a heteroatom and may include a heteroatom, a substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom, or a substituted or unsubstituted hydrocarbon group which includes a group having a proton donating group protected by a leaving group that leaves by an action of an acid, and may include a heteroatom. ### Claim 6 (depends on 5) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 5, wherein the cyclic structure including a heteroatom represents a substituted or unsubstituted lactone structure, a substituted or unsubstituted sultone structure, or a substituted or unsubstituted cyclic carbonate structure, and the proton donating group represents a sulfonamido group, a carboxyl group, or a hydroxyl group. ### Claim 7 (depends on 5) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 5, wherein the substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom represents a linear or branched, substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom. ### Claim 8 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, wherein the resin further includes a repeating unit having a polar group. ### Claim 9 (depends on 1) The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1, further comprising a photoacid generator. ### Claim 10 (depends on 1) A resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1. ### Claim 11 (depends on 1) A pattern forming method comprising: forming a resist film using the actinic ray-sensitive or radiation-sensitive resin composition according to claim 1; exposing the resist film; and developing the exposed resist film using a developer. ### Claim 12 (depends on 11) A method for manufacturing an electronic device, comprising the pattern forming method according to claim 11. ### Claim 13 A resin including a repeating unit represented by General Formula (1) and capable of increasing a polarity by an action of an acid, in General Formula (1), X represents —SO2—, —SO—, or —CS—, Y represents a divalent linking group, R1 represents a monovalent organic group, and R2 to R5 each independently represent a hydrogen atom or a monovalent organic group. ### Claim 14 (depends on 13) The resin according to claim 13, wherein the resin is a resin including the repeating unit represented by General Formula (1) and a repeating unit having an acid-decomposable group, or a resin including the repeating unit represented by General Formula (1) where R1 represents a monovalent organic group including an acid-decomposable group. ### Claim 15 (depends on 13) The resin according to claim 13, wherein Y represents a substituted or unsubstituted alkylene group, —CO—, —SO2—, —SO—,or —CS—. ### Claim 16 (depends on 13) The resin according to claim 13, wherein R1 represents a substituted or unsubstituted hydrocarbon group including a heteroatom. ### Claim 17 (depends on 13) The resin according to claim 13, wherein R1 represents a substituted or unsubstituted hydrocarbon group which includes a cyclic structure including a heteroatom and may include a heteroatom, a substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom, or a substituted or unsubstituted hydrocarbon group which includes a group having a proton donating group protected by a leaving group that leaves by an action of an acid, and may include a heteroatom. ### Claim 18 (depends on 17) The resin according to claim 17, wherein the cyclic structure including a heteroatom represents a substituted or unsubstituted lactone structure, a substituted or unsubstituted sultone structure, or a substituted or unsubstituted cyclic carbonate structure, and the proton donating group represents a sulfonamido group, a carboxyl group, or a hydroxyl group. ### Claim 19 (depends on 17) The resin according to claim 17, wherein the substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom represents a linear or branched, substituted or unsubstituted hydrocarbon group which includes a proton donating group and may include a heteroatom. ### Claim 20 (depends on 13) The resin according to claim 13, further comprising a repeating unit having a polar group.