# US 12,007,685 B2 · Method for forming structure of pellicle-mask structure with vent structure > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,007,685 B2 - Document ID: US12007685B2 - Status: Granted - Kind: B2 - Application number: 17/461,323 - Filed: 2021-08-30 - Published: 2021-12-16 - Granted: 2024-06-11 - Earliest claimed: 2017-11-08 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Co., Ltd. - Inventors: Yun-Yue Lin - Web page: https://patentgrep.com/patent/US12007685B2 ## CPC - G03F 1/64: characterised by the frames, e.g. structure or material, including bonding means therefor - G03F 1/22: Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A method for forming a structure of a pellicle-mask structure is provided. The method includes bonding a pellicle frame to a mask through a pellicle frame adhesive. The method also includes forming a vent structure in the pellicle frame. The method further includes bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive. A first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive. ## Claims ### Claim 1 A method for forming a pellicle-mask structure, comprising: bonding a pellicle frame to a mask through a pellicle frame adhesive; forming a vent structure in the pellicle frame; and bonding a pellicle membrane to the pellicle frame through a pellicle membrane adhesive, wherein a first size of the pellicle membrane adhesive is greater than a second size of the pellicle frame adhesive. ### Claim 2 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein forming the vent structure comprises: forming an opening in the pellicle frame, wherein the opening penetrates through an inner surface and an outer surface of the pellicle frame; and placing the vent structure into the opening. ### Claim 3 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein the pellicle membrane adhesive comprises a first heat-dissipating filler. ### Claim 4 (depends on 3) The method for forming the pellicle-mask structure as claimed in claim 3, wherein the first heat-dissipating filler is made of aluminum nitride, boron nitride, aluminum oxide, magnesium oxide, silicon oxide, graphite, metal powder, ceramic powder, or a combination thereof. ### Claim 5 (depends on 3) The method for forming the pellicle-mask structure as claimed in claim 3, wherein the pellicle frame adhesive comprises a second heat-dissipating filler. ### Claim 6 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein the pellicle membrane has a porous structure, and the porous structure comprises a plurality of pores. ### Claim 7 (depends on 6) The method for forming the pellicle-mask structure as claimed in claim 6, wherein the plurality of pores connect an upper surface of the pellicle membrane to a lower surface of the pellicle membrane. ### Claim 8 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein an outer sidewall of the pellicle frame is substantially aligned with an outer sidewall of the pellicle frame adhesive. ### Claim 9 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein a bottom surface of the pellicle frame, an inner sidewall of the pellicle frame adhesive and a top surface of the mask enclose a space. ### Claim 10 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein the pellicle membrane, the pellicle frame, the pellicle frame adhesive and the mask enclose an inner space, and a first lateral width of a lower portion of the inner space is greater than a second lateral width of an upper portion of the inner space. ### Claim 11 (depends on 1) The method for forming the pellicle-mask structure as claimed in claim 1, wherein the vent structure is made of a material that is different from that of the pellicle frame. ### Claim 12 A method for forming a pellicle-mask structure, comprising: disposing a pellicle frame over a mask substrate; forming a vent structure in the pellicle frame, wherein the vent structure has a plurality of sub-ventilation holes exposing a suspended section of a bottom surface of the pellicle frame, wherein a bottommost surface of the vent structure is substantially aligned with a bottommost surface of the pellicle frame; and disposing a pellicle membrane over the pellicle frame. ### Claim 13 (depends on 12) The method for forming the pellicle-mask structure as claimed in claim 12, wherein the vent structure is separated from an inner surface of the pellicle frame. ### Claim 14 (depends on 12) The method for forming the pellicle-mask structure as claimed in claim 12, further comprising: disposing a heat-dissipating layer on the pellicle membrane. ### Claim 15 (depends on 14) The method for forming the pellicle-mask structure as claimed in claim 14, wherein the heat-dissipating layer is made of Zr, Nb, Mo, Cd, Ru, Ti, Al, Mg, V, Hf, Ge, Mn, Cr, W, Ta, Ir, Zn, Cu, Fe, Co, Au, Pt, Sn, Ni, Te, Ag, silicon oxide, silicon nitride, or silicon oxynitride. ### Claim 16 (depends on 12) The method for forming the pellicle-mask structure as claimed in claim 12, further comprising: disposing a heat-dissipating layer between the pellicle membrane and the pellicle frame. ### Claim 17 A method for forming a pellicle-mask structure, comprising: forming a mask pattern on a mask substrate; bonding a pellicle frame to the mask pattern through a pellicle frame adhesive, wherein an inside surface of the pellicle frame and an outside surface of the pellicle frame opposite to each other and a bottom surface of the pellicle frame connecting the inside surface of the pellicle frame and the outside surface of the pellicle frame; forming an opening in the pellicle frame to expose the outside surface of the pellicle frame and the bottom surface of the pellicle frame, wherein the bottom surface of the pellicle frame, an inner sidewall of the pellicle frame adhesive and a top surface of the mask pattern enclose a space; disposing a vent structure into the opening; and disposing a pellicle membrane over the pellicle frame. ### Claim 18 (depends on 17) The method for forming the pellicle-mask structure as claimed in claim 17, wherein an interface between the space and the pellicle frame adhesive is between opposite sidewalls of the pellicle frame. ### Claim 19 (depends on 17) The method for forming the pellicle-mask structure as claimed in claim 17, wherein an interface between the space and the pellicle frame adhesive is in direct contact with the vent structure. ### Claim 20 (depends on 17) The method for forming the pellicle-mask structure as claimed in claim 17, wherein an outer sidewall of the pellicle frame adhesive is substantially aligned with a sidewall of the pellicle frame and a sidewall of the vent structure.