# US 12,007,658 B2 · Method for protecting a glass substrate coated with an electrochromic stack and method for producing an insulating glazing

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- Number: US 12,007,658 B2
- Document ID: US12007658B2
- Status: Granted
- Kind: B2
- Application number: 17/436,428
- Filed: 2020-03-13
- Published: 2022-05-26
- Granted: 2024-06-11
- Earliest claimed: 2019-03-14
- Assignees: Saint-Gobain Glass France
- Applicants: Saint-Gobain Glass France
- Inventors: Florent Martin; Charline Lalande; Bertrand Heurtefeu; Jean-Christophe Giron
- Web page: https://patentgrep.com/patent/US12007658B2

## CPC

- C03C 17/3417: {all coatings being oxide coatings}
- G02F 1/1533: {structural features not otherwise provided for}
- C03C 17/42: at least one coating of an organic material and at least one non-metal coating
- C03C 2218/328: Partly or completely removing a coating
- C03C 2218/355: Temporary coating
- G02F 2001/1536: {additional, e.g. protective, layer inside the cell}
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

A process for protecting a glass substrate coated with an electrochromic stack, includes depositing a temporary protective layer on the electrochromic stack, the temporary protective layer including an organic polymeric matrix and having a thickness of between 1 μm and 30 μm, and the temporary protective layer being removable by heat treatment at a temperature of between 300° C. and 500° C., fora period of between 180 s and 240 s.

## Claims

### Claim 1

A process for protecting a glass substrate coated with an electrochromic stack, comprising:
depositing a temporary protective layer on said electrochromic stack, said electrochromic stack including a layer of electrochromic material, said temporary protective layer comprising an organic polymeric matrix and having a thickness between 1 μm and 30 μm, and
removing said temporary protective layer by heat treatment at a temperature between 300° C. and 500° C. for a period of between 180 s and 240 s such that the temporary protective layer deposited on said glass substrate coated with said electrochromic stack is removed without tempering, bending or annealing said glass substrate during said heat treatment and without crystallizing said layer of electrochromic material during said heat treatment.

### Claim 2 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the temporary protective layer has a thickness between 5 μm and 20 μm.

### Claim 3 (depends on 2)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 2, wherein the temporary protective layer has a thickness between 5 μm and 15 μm.

### Claim 4 (depends on 3)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 3, wherein the temporary protective layer has a thickness of 15 μm.

### Claim 5 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the temperature of the heat treatment is between 400° C. and 500° C.

### Claim 6 (depends on 3)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 3, wherein the temperature of the heat treatment is between 400° C. and 450° C.

### Claim 7 (depends on 6)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 6, wherein the temperature of the heat treatment is between 400° C. and 420° C.

### Claim 8 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the heat treatment period is between 200 s and 220 s.

### Claim 9 (depends on 4)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 4, wherein the heat treatment period is between 205 s and 215 s.

### Claim 10 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the heat treatment is carried out by a firing oven.

### Claim 11 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the organic polymeric matrix is obtained from a polymerizable liquid composition comprising (meth)acrylate compounds.

### Claim 12 (depends on 6)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 6, wherein the (meth)acrylate compounds having reacted with one another represent at least 90% by weight of the weight of the temporary protective layer.

### Claim 13 (depends on 6)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 6, wherein the polymerizable liquid composition comprising (meth)acrylate compounds comprises less than 20% by weight of solvent relative to the total weight of the liquid composition and a viscosity, measured at 25° C., of between 0.05 and 5 Pa·s.

### Claim 14 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the temporary protective layer is deposited on the electrochromic stack by roller-coating.

### Claim 15 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the removal of said temporary protective layer by the heat treatment is followed by a step of wiping with a cloth or of washing.

### Claim 16 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the process is free of a step of heat treatment of tempering.

### Claim 17 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the electrochromic stack comprises successively the following layers starting from the substrate:
a first transparent electrically conductive layer having a thickness of 390 nm,
a layer of electrochromic material having a thickness of 400 nm,
a layer of an ionically conductive electrolyte having a thickness of 15 nm,
a counter electrode layer having a thickness of 270 nm,
a second transparent electrically conductive layer having a thickness of 420 nm.

### Claim 18 (depends on 12)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 12, wherein the electrochromic stack further comprises:
a first underlayer having a thickness of 5 nm, and
a second underlayer having a thickness of 30 nm, said first and second underlayers being located under the first transparent electrically conductive layer, and
an overlayer having a thickness of 70 nm,
said overlayer being located above the second transparent electrically conductive layer.

### Claim 19 (depends on 1)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 1, wherein the temperature of the heat treatment is between 400° C. and 450° C. and the heat treatment period is between 200 s and 220 s.

### Claim 20 (depends on 19)

The process for protecting a glass substrate coated with an electrochromic stack as claimed in claim 19, wherein a thickness of the glass substrate is between 1.5 mm and 3.5 mm, or wherein the thickness of the glass substrate is 6 mm.

### Claim 21

A process for producing an insulating glazing comprising a first glass substrate coated with an electrochromic stack, the process comprising:
depositing of a temporary protective layer on said electrochromic stack, said electrochromic stack including a layer of electrochromic material, said temporary protective layer comprising an organic polymeric matrix and having a thickness of between 1 μm and 30 μm,
performing a manipulation and/or transformation and/or treatment and/or transportation and/or washing and/or storage of said protected substrate,
removing said temporary protective layer by heat treatment at a temperature of between 300° C. and 500° C., for a period ranging from 180 s to 240 s such that the temporary protective layer deposited on said glass substrate coated with said electrochromic stack is removed during said heat treatment without tempering, bending or annealing said glass substrate and without crystallizing said layer of electrochromic material,
applying bus bars on the electrochromic stack devoid of protective layer,
assembling by lamination of the face opposite the glass substrate coated with the electrochromic stack with a counter-glass so as to form a laminated glazing, and
assembling the laminated glazing as an insulating glazing by a spacer and of a second glass substrate.

### Claim 22 (depends on 14)

The process for producing an insulating glazing as claimed in claim 14 also comprising a cutting step before or after removing the temporary protective layer.
