Purification apparatus and method of purifying hot zone parts
AssigneeGlobalWafers Co., Ltd.
InventorsChung-Sheng Chang, Masami Nakanishi, Yu-Sheng Su, Yen-Hsun Chu, Yung-Chi Wu, Yi-Hua Fan
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AssigneeGlobalWafers Co., Ltd.
InventorsChung-Sheng Chang, Masami Nakanishi, Yu-Sheng Su, Yen-Hsun Chu, Yung-Chi Wu, Yi-Hua Fan
Estimating the term…
A purification apparatus and a method of purifying hot zone parts are provided. The purification apparatus is configured to remove impurities attached on at least one hot zone part. The purification apparatus includes a crystal high temperature furnace, an enclosed box disposed in the crystal high temperature furnace, an outer tube connected to the crystal high temperature furnace and the enclosed box, an inner tube disposed in the outer tube, and a gas inlet cover connected to the outer tube. The crystal high temperature furnace includes a furnace body, a furnace cover, and a thermal field module disposed in the furnace body. The gas inlet cover is configured to input a noble gas into the enclosed box through the inner tube, and the thermal field module is configured to heat the noble gas so that the impurities are heated and vaporized through the noble gas.
A purification apparatus, which is configured to remove impurities attached on at least one hot zone part, the purification apparatus comprising:
Dependencies are inferred from the claim text.