# US 12,006,571 B2 · Atomic layer deposition apparatus for coating on fine powders > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,006,571 B2 - Document ID: US12006571B2 - Status: Granted - Kind: B2 - Application number: 17/199,292 - Filed: 2021-03-11 - Published: 2022-04-07 - Granted: 2024-06-11 - Earliest claimed: 2020-10-06 - Assignees: Sky Tech Inc. - Applicants: Sky Tech Inc. - Inventors: Jing-Cheng Lin; Ching-Liang Yi; Jung-Hua Chang; Chia-Cheng Ku - Web page: https://patentgrep.com/patent/US12006571B2 ## CPC - C23C 16/45544: {characterized by the apparatus} - C23C 16/403: {of aluminium, magnesium or beryllium} - C23C 16/4417: {Methods specially adapted for coating powder} - C23C 16/442: using fluidised bed process - C23C 16/4557: {Heated nozzles} - C23C 16/45574: {Nozzles for more than one gas} - B82Y 30/00: Nanotechnology for materials or surface science, e.g. nanocomposites - H10H 20/0361: {of wavelength conversion means} - H10H 20/80: Constructional details - H10H 20/8512: {Wavelength conversion materials} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - H10H: INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS ## Abstract An atomic layer deposition apparatus for coating on fine powders is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit. The shaft sealing device includes an outer tube and an inner tube arranged in an accommodating space of the outer tube. The driving unit drives the vacuum chamber to rotate through the outer tube to agitate the fine powders in a reaction space of the vacuum chamber. An air extraction line and an air intake line are arranged in a connection space of the inner tube. The air extraction line is used to extract gas from the reaction space. The air intake line is used to transport non-reactive gas to the reaction space to blow the fine powders around in the reaction space and precursor gas to the reaction space to form thin films with uniform thickness on the surface of the fine powders. ## Claims ### Claim 1 An atomic layer deposition apparatus for coating on fine powders, comprising: a vacuum chamber, comprising a reaction space for accommodating a plurality of fine powders; a shaft sealing device, comprising an outer tube and an inner tube, wherein the outer tube comprises an accommodating space for accommodating the inner tube, and the inner tube comprises a connection space; a driving unit, connected to the vacuum chamber through the outer tube of the shaft sealing device, for driving the vacuum chamber to rotate relative to the inner tube through the outer tube; at least one air extraction line, disposed in the connection space of the inner tube and fluidly connected to the reaction space of the vacuum chamber, for extracting a gas from the reaction space; at least one air intake line, disposed in the connection space of the inner tube and fluidly connected to the reaction space of the vacuum chamber, for transporting a precursor or a non-reactive gas to the reaction space, wherein the non-reactive gas blows the fine powders around in the reaction space; and at least one mount bracket and a support base connected to the mount bracket through at least one connecting shaft; wherein the driving unit, the vacuum chamber, and the shaft sealing device are disposed on the support base, and the support base rotates relative to the mount bracket with the connecting shaft as axis to change an inclination angle of the driving unit, the vacuum chamber, and the shaft sealing device; wherein when the driving unit drives the outer tube and the vacuum chamber to rotate, the inner tube, the at least one air extraction line in the connection space of the inner tube, and the at least one air intake line in the connection space of the inner tube stay stationary. ### Claim 2 (depends on 1) The atomic layer deposition apparatus of claim 1, wherein the air intake line comprises at least one non-reactive gas line disposed in the connection space of the inner tube and fluidly connected to the reaction space of the vacuum chamber, for transporting the non-reactive gas to the reaction space of the vacuum chamber to blow the fine powders around in the reaction space; wherein when the driving unit drives the outer tube and the vacuum chamber to rotate, the at least one non-reactive gas line in the connection space of the inner tube stays stationary. ### Claim 3 (depends on 1) The atomic layer deposition apparatus of claim 1, wherein the shaft sealing device is a magnetic fluid shaft seal. ### Claim 4 (depends on 3) The atomic layer deposition apparatus of claim 3, further comprising: at least one gear, connected the driving unit and the outer tube of the shaft sealing device, wherein the driving unit drives the outer tube of the shaft sealing device and the vacuum chamber to rotate relative to the inner tube through the gear. ### Claim 5 (depends on 1) The atomic layer deposition apparatus of claim 1, wherein the inner tube extends from the accommodating space of the outer tube into the reaction space of the vacuum chamber and forming a protruding tube part in the reaction space. ### Claim 6 (depends on 1) The atomic layer deposition apparatus of claim 1, wherein the vacuum chamber comprises a cover lid, a chamber, and a monitor wafer, an inner surface of the cover lid covers the chamber to form the reaction space between the cover lid and the chamber, and the monitor wafer is disposed on the inner surface of the cover lid. ### Claim 7 (depends on 6) The atomic layer deposition apparatus of claim 6, further comprising an inspection hole disposed on the cover lid. ### Claim 8 (depends on 7) The atomic layer deposition apparatus of claim 7, further comprising a non-contact type temperature sensor facing the inspection hole on the cover lid for measuring a temperature inside the reaction space. ### Claim 9 (depends on 8) The atomic layer deposition apparatus of claim 8, further comprising a temperature sensor facing the vacuum chamber for measuring a temperature on a surface of the vacuum chamber. ### Claim 10 (depends on 6) The atomic layer deposition apparatus of claim 6, wherein the chamber is made of a light-transmitting material. ### Claim 11 (depends on 1) The atomic layer deposition apparatus of claim 1, further comprising: a filter unit, disposed at one end of the inner tube connecting to the reaction space, wherein the gas extracted from the reaction chamber by the air extraction line passes through the filter unit. ### Claim 12 (depends on 1) The atomic layer deposition apparatus of claim 1, wherein the vacuum chamber is fixed to the shaft sealing device through at least one fixing member, and the vacuum chamber separates from the shaft sealing device when the fixing member is dislodged. ### Claim 13 (depends on 12) The atomic layer deposition apparatus of claim 12, wherein the vacuum chamber comprises a recess disposed on a bottom of the vacuum chamber for accommodating a part of the shaft sealing device.