# US 12,005,389 B1 · Retrofittable dry media abatement reactor > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,005,389 B1 - Document ID: US12005389B1 - Status: Granted - Kind: B1 - Application number: 18/479,346 - Filed: 2023-10-02 - Granted: 2024-06-11 - Earliest claimed: 2023-10-02 - Assignees: GlobalFoundries U.S. Inc. - Applicants: GlobalFoundries U.S. Inc. - Inventors: Justin Weinstein; Kimberly E. Konar - Web page: https://patentgrep.com/patent/US12005389B1 ## CPC - B01D 53/0446: {Means for feeding or distributing gases} - B01D 53/0423: {Beds in columns} - B01D 53/30: Controlling by gas-analysis apparatus (regulating non electrical variables in general G05D) - B01D 53/40: Acidic components (B01D53/44 takes precedence) - B01D 53/82: with stationary reactants - B01D 2253/102: Carbon - B01D 2258/0216: from CVD treatment or semi-conductor manufacturing - B01D 2259/4145: arranged in series - H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)} - B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes a media canister to abate the emission stream in response to an abatement fault in an abatement apparatus. The media canister includes a reaction chamber configured to receive the emission stream in response to the abatement fault, and a dry media disposed within the reaction chamber to abate the emission stream. The dry media includes at least one reactive and/or absorbent material which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream and yield exhaust substantially free of the at least one pollutant. ## Claims ### Claim 1 A system comprising: an abatement apparatus having at least one of a combustion chamber and a water-based chamber configured to abate an emission stream from a semiconductor manufacturing process; a vacuum pump coupled to the abatement apparatus and configured to transmit the emission stream from the semiconductor manufacturing process through the abatement apparatus; and a media canister coupled to the vacuum pump and configured to abate the emission stream in response to an abatement fault in the abatement apparatus, wherein the media canister comprises: a reaction chamber having an inlet configured to receive the emission stream, and a dry media disposed within the reaction chamber and configured to abate the emission stream therein. ### Claim 2 (depends on 1) The system of claim 1, further comprising: a sensor coupled to the abatement apparatus and configured to detect the abatement fault; and a bypass valve fluidly coupled between the vacuum pump and the media canister, wherein the bypass valve is configured to fluidly couple the emission stream to the media canister in response to the sensor detecting the abatement fault. ### Claim 3 (depends on 2) The system of claim 2, further comprising a controller operatively coupled to the sensor and the bypass valve, wherein the controller is configured to actuate the bypass valve in response to sensor signals transmitted from the sensor in response to detecting the abatement fault. ### Claim 4 (depends on 2) The system of claim 2, wherein the media canister comprises: a first conduit fluidly coupled between the bypass valve and the inlet; a second conduit fluidly coupled to an outlet of the reaction chamber; and a valve disposed along at least one of the first conduit and the second conduit, wherein the valve is configured to adjust the emission stream flow rate through at least one of the first conduit and the second conduit. ### Claim 5 (depends on 4) The system of claim 4, wherein the first conduit comprises: a first end coupled to the bypass valve; a second end having a manifold coupled to the inlet; and a gas port disposed along the first conduit between the first end and the second end, wherein the valve is disposed along the first conduit between the inlet and the gas port. ### Claim 6 (depends on 1) The system of claim 1, wherein the reaction chamber comprises a sealable hatch configured to receive the dry media therein. ### Claim 7 (depends on 1) The system of claim 1, wherein the dry media comprises at least one of acid removal media, base removal media, volatile organic compounds (VOC) removal media, greenhouse gas (GHG) removal media, combustible gas removal media, hydride removal media, activated carbon media, or a combination of these removal medias. ### Claim 8 (depends on 1) The system of claim 1, wherein the dry media comprises a plurality of stages that each include at least one media which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream. ### Claim 9 (depends on 8) The system of claim 8, wherein the plurality of stages of the dry media comprises: a first stage of an acid removal media; a second stage of a hydride removal media; and a third stage of an activated carbon media. ### Claim 10 (depends on 9) The system of claim 9, wherein the acid removal media comprises calcium carbonate (CaCO3), and wherein the hydride removal media comprises a metal oxide. ### Claim 11 A media canister comprising: a reaction chamber having an inlet configured to receive an emission stream from a semiconductor manufacturing process; a dry media disposed within the reaction chamber and configured to abate the emission stream therein, wherein the media canister is configured to abate the emission stream in response to an abatement fault in an abatement apparatus; a first conduit including a first end coupled to a bypass valve, and a second end having a manifold coupled to the inlet of the reaction chamber, wherein the bypass valve is configured to fluidly couple the emission stream to the media canister in response to the abatement fault; a second conduit coupled to an outlet of the reaction chamber; and a valve disposed along at least one of the first conduit and the second conduit, wherein the valve is configured to adjust the emission stream flow rate through at least one of the first conduit and the second conduit. ### Claim 12 (depends on 11) The media canister of claim 11, wherein the first conduit comprises a gas port disposed along the first conduit between the first end and the second end, wherein the valve is disposed along the first conduit between the inlet and the gas port. ### Claim 13 (depends on 11) The media canister of claim 11, wherein the reaction chamber comprises a sealable hatch configured to receive the dry media therein. ### Claim 14 (depends on 11) The media canister of claim 11, wherein the dry media comprises at least one of acid removal media, base removal media, volatile organic compounds (VOC) removal media, greenhouse gas (GHG) removal media, combustible gas removal media, hydride removal media, activated carbon media, or a combination of these removal medias. ### Claim 15 (depends on 11) The media canister of claim 11, wherein the dry media comprises a plurality of stages that each include at least one media which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream. ### Claim 16 (depends on 15) The media canister of claim 15, wherein the plurality of stages of the dry media comprises: a first stage of an acid removal media; a second stage of a hydride removal media; and a third stage of an activated carbon media. ### Claim 17 (depends on 16) The media canister of claim 16, wherein the acid removal media comprises calcium carbonate (CaCO3). ### Claim 18 (depends on 16) The media canister of claim 16, wherein the hydride removal media comprises a metal oxide. ### Claim 19 (depends on 11) The media canister of claim 11, wherein the dry media comprises at least one granulate. ### Claim 20 (depends on 19) The media canister of claim 19, wherein the dry media comprises copper-based granulate, aluminum-based granulate, zeolite-based granulate, calcium-based granulate, magnesium-based granulate, carbon-based granulate, gallium-based granulate, titanium-based granulate, or a combination of these granulates.