# US 12,002,765 B2 · Marks for overlay measurement and overlay error correction

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- Number: US 12,002,765 B2
- Document ID: US12002765B2
- Status: Granted
- Kind: B2
- Application number: 17/568,041
- Filed: 2022-01-04
- Published: 2023-07-06
- Granted: 2024-06-04
- Earliest claimed: 2022-01-04
- Assignees: Nanya Technology Corporation
- Applicants: Nanya Technology Corporation
- Inventors: Shih-Yuan Ma
- Web page: https://patentgrep.com/patent/US12002765B2

## CPC

- H10W 46/00: Marks applied to devices, e.g. for alignment or identification
- G03F 1/42: Alignment or registration features, e.g. alignment marks on the mask substrates
- H10W 46/301: {for alignment}
- H10W 46/503: {Located in scribe lines}
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A mark for overlay error measurement and overlay error measurement is provided. The mark includes a first pattern and a second pattern. The first pattern is disposed on a first surface of a substrate. The second pattern is disposed on a second surface of the substrate. The second surface of the substrate is opposite to the first surface of the substrate. The first pattern overlaps at least a portion of the second pattern, and the first pattern and the second pattern collaboratively define a first overlay error.

## Claims

### Claim 1

A mark for overlay error correction, comprising:
a first pattern disposed on a first surface of a substrate;
a second pattern disposed on a second surface of the substrate, wherein the second surface of the substrate is opposite to the first surface of the substrate, and
a dummy layer disposed on the first surface of the substrate, wherein the first pattern is defined by the dummy layer;
wherein the first pattern overlaps at least a portion of the second pattern, wherein the first pattern and the second pattern collaboratively define a first overlay error.

### Claim 2 (depends on 1)

The mark of claim 1, wherein a first profile of the first pattern and a second profile of the second pattern are equiform.

### Claim 3 (depends on 1)

The mark of claim 1, wherein the first pattern protrudes from the first surface of the substrate.

### Claim 4 (depends on 1)

The mark of claim 1, further comprising:
a third pattern disposed on the first surface of the substrate; and
a fourth pattern disposed on the first surface of the substrate, wherein the third pattern at least overlaps the fourth pattern, and the second pattern is located at a first horizontal level different than a horizontal level of the fourth pattern.

### Claim 5 (depends on 4)

The mark of claim 4, wherein the first pattern is located at a horizontal level different from that of the third pattern.

### Claim 6 (depends on 1)

The mark of claim 1, further comprising:
a plurality of fifth patterns disposed on the second surface of the substrate and located at a horizontal level the same as that of the second pattern; and
a plurality of sixth patterns disposed on the second surface of the substrate and located at a horizontal level between that of the first pattern and that of the second pattern, and the plurality of fifth patterns and the plurality of sixth patterns are utilized to collaboratively generate a second overlay error.

### Claim 7 (depends on 6)

The mark of claim 6, wherein each of the plurality of fifth patterns is free from overlapping the plurality of sixth patterns.

### Claim 8 (depends on 6)

The mark of claim 6, wherein each of the plurality of fifth patterns is located in a quadruple area, respectively.

### Claim 9

A mark for overlay error correction, comprising:
a first overlay mark comprising a first pattern and a second pattern disposed on a first surface of a substrate, wherein the first overlay mark is utilized to generate a first overlay error; and
a second overlay mark comprising a third pattern disposed on a second surface of the substrate and a fourth pattern disposed on the first surface of the substrate, wherein the first surface of the substrate is opposite to the second surface of the substrate,
wherein the second overlay mark is utilized to generate a second overlay error, and the second overlay mark is utilized to correct the first overlay error.

### Claim 10 (depends on 9)

The mark of claim 9, wherein the third pattern overlaps at least the fourth pattern.

### Claim 11 (depends on 9)

The mark of claim 9, wherein a profile of the third pattern and a profile of the fourth pattern are equiform in a plan view.

### Claim 12 (depends on 9)

The mark of claim 9, wherein the third pattern protrudes from the second surface of the substrate.

### Claim 13 (depends on 9)

The mark of claim 9, further comprising:
a dummy layer disposed on the second surface of the substrate, wherein the third pattern is defined by the dummy layer.

### Claim 14 (depends on 9)

The mark of claim 9, wherein the third pattern is recessed from the second surface of the substrate.

### Claim 15 (depends on 9)

The mark of claim 9, wherein the second pattern is located at a horizontal level the same as that of the fourth pattern.

### Claim 16 (depends on 15)

The mark of claim 15, wherein the first pattern is located at a horizontal level between that of the second pattern and that of the third pattern.

### Claim 17 (depends on 9)

The mark of claim 9, wherein the first pattern is free from overlapping the second pattern, and the third pattern is composed of a single continuous pattern.