# US 12,002,688 B2 · Substrate cleaning device and substrate cleaning method

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- Number: US 12,002,688 B2
- Document ID: US12002688B2
- Status: Granted
- Kind: B2
- Application number: 18/328,626
- Filed: 2023-06-02
- Published: 2023-09-28
- Granted: 2024-06-04
- Earliest claimed: 2018-07-06
- Assignees: Ebara Corporation
- Applicants: Ebara Corporation
- Inventors: Haiyang Xu; Mitsuhiko Inaba
- Web page: https://patentgrep.com/patent/US12002688B2

## CPC

- B24B 37/04: designed for working plane surfaces
- B08B 1/143: {Wipes}
- B08B 1/145: {Swabs}
- B08B 1/34: rotating about an axis parallel to the surface
- B24B 37/34: Accessories
- H10P 70/60: {Cleaning only by mechanical processes}
- H10P 72/0412: {using mainly scrubbing means, e.g. brushes}
- H10P 72/0414: {using mainly spraying means, e.g. nozzles}
- H10P 72/0472: {comprising at least one polishing chamber}
- H10P 72/0604: {Process monitoring, e.g. flow or thickness monitoring}
- B24B: MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING (grinding of gear teeth B23F, of screw-threads B23G1/36; by electro-erosion B23H; abrasive or related blasting B24C; tools for grinding, buffing or sharpening B24D; polishing compositions C09G1/00; abrasives C09K3/14; electrolytic etching or polishing C25F3/00; grinding arrangements for use on assembled railway tracks E01B31/17); DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A substrate cleaning device includes: a pressing member that cleans a substrate by contacting the substrate; a load measurement unit that measures a pressing load of the cleaning member; and a control unit that repeats an operation of comparing the measurement value of the load measurement unit with the setting load, changing the pressing amount of the cleaning member by a first movement amount so that a difference value decreases, when the difference value is larger than a first threshold value and equal to or smaller than a second threshold value, and changing the pressing amount of the cleaning member by a second movement amount larger than the first movement amount so that the difference value decreases, when the difference value is larger than the second threshold value, until the difference value becomes equal to or smaller than the first threshold value.

## Claims

### Claim 1

A substrate cleaning device comprising:
a cleaning member configured to clean a substrate by contacting the substrate;
a member rotation unit configured to rotate the cleaning member;
a member drive unit configured to press the cleaning member against the substrate;
a load measurement unit configured to measure a measurement value of an applied pressing load of the cleaning member; and a control unit configured to
control an applied pressing amount of the cleaning member by the member drive unit, on the basis of the measurement value of the load measurement unit, so that the applied pressing load of the cleaning member becomes a setting load,
store a correspondence relation between pressing loads and pressing amounts of the cleaning member for M different stored pressing loads as master data,
acquire the correspondence relation between the pressing loads and the pressing amounts of the cleaning member for N different pressing, loads among the M different stored pressing loads as measurement data, on the basis of the measurement value of the load measurement unit,
correct each of the pressing amounts corresponding to the M different stored pressing loads in the master data, on the basis of the measurement data, so that the correspondence relation between the pressing loads and the pressing amounts for the N different pressing loads in the master data approaches the correspondence relation between the pressing loads and the pressing amounts for the N different pressing loads in the measurement data, and generate data for a movement amount calculation showing the correspondence relation between the pressing loads and the pressing amounts for the M different stored pressing loads, and
calculate a calculated pressing amount of the cleaning member corresponding to the setting load, on the basis of the correspondence relation between the pressing loads and the pressing amounts in the data for movement amount calculation.

### Claim 2 (depends on 1)

The substrate cleaning device according to claim 1, wherein
N is smaller than M.

### Claim 3 (depends on 1)

The substrate cleaning device according to claim 1, wherein
the cleaning member is any one member of the group consisting of a roll cleaning member, a pencil cleaning member, and a buff cleaning/polishing member.

### Claim 4 (depends on 1)

The substrate cleaning device according to claim 1, wherein
the member drive unit is an electric actuator.

### Claim 5 (depends on 1)

A substrate processing apparatus comprising the substrate cleaning device according to claim 1.

### Claim 6 (depends on 2)

A substrate processing apparatus comprising the substrate cleaning device according to claim 2.