Adjusting method of charged particle beam device and charged particle beam device system

A method for adjusting contrast and brightness of an image obtained by scanning a sample with a charged particle beam to inspect a pattern included in the image, comprising the steps of:

• scanning the sample with a beam of a first condition;
• scanning the sample with a beam of a second condition different from the first condition;
• evaluating a characteristic of a first image obtained by scanning with the first condition beam;
• evaluating a characteristic of a second image obtained by scanning with the second condition beam;
• adjusting offset of a signal processing device of a charged particle beam device so that the characteristic of the first image becomes in a predetermined state;
• and
• adjusting a gain of the signal processing device so that a difference between the characteristic of the second image and the characteristic of the first image becomes in a predetermined state,
• wherein at least one of the first condition beam and the second condition beam is a pulse beam, and
• wherein the contrast and the brightness are adjusted by adjusting the signal processing device, and after adjusting the offset and adjusting the gain, a pattern included in a third image is inspected, the third image is obtained by scanning with a third charged particle beam that is a pulse beam.

A charged particle beam system comprising:

• a deflector structured to scan a charged particle beam emitted from a charged particle source;
• a signal processing device for processing a signal of detection of charged particles obtained by scanning a sample with the charged particle beam;
• and a controller,
• wherein the controller is structured to
• evaluate a characteristic of a first image obtained by scanning with a beam of a first condition and a characteristic of a second image obtained by scanning with a beam of a second condition different from the first condition,
• adjust contrast and brightness of an image obtained by scanning the sample with the charged particle beam, by controlling the signal processing device so that the characteristic of the first image becomes in a predetermined state and a difference between the characteristic of the first image and the characteristic of the second image becomes in a predetermined state, and
• after adjusting the offset and adjusting the gain, inspect a pattern included in a third image obtained by scanning with a third charged particle beam that is a pulse beam, and
• wherein at least one of the first condition beam and the second condition beam is a pulse beam.