# US 12,001,149 B2 · Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,001,149 B2 - Document ID: US12001149B2 - Status: Granted - Kind: B2 - Application number: 17/428,897 - Filed: 2020-01-24 - Published: 2022-03-10 - Granted: 2024-06-04 - Earliest claimed: 2019-02-08 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Marcus Adrianus Van De Kerkhof - Web page: https://patentgrep.com/patent/US12001149B2 ## CPC - G03F 7/70925: {Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning} - G03F 1/38: Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof - G03F 1/82: Auxiliary processes, e.g. cleaning or inspecting - G03F 7/707: {Chucks, e.g. chucking or un-chucking operations or structural details} - G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps} - H10P 72/0406: {for cleaning followed by drying, rinsing, stripping, blasting or the like} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A method of protecting a component of a lithographic apparatus, the method including the steps of: providing a protective cover which is shaped to protect at least part of said component, the protective cover having a contact surface which is arranged to adhere to a first surface of at least part of said lithographic apparatus or said component; and bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or said component and remain adhered without the application of external force. It is also provided a patterning device for use in a lithographic apparatus and a lithographic apparatus. ## Claims ### Claim 1 A method comprising: providing a protective reticle cover or reticle that is shaped to protect at least part of a component of a lithographic apparatus, the protective reticle cover or the reticle having a contact surface that is arranged to adhere to at least part of the component; and bringing the protective reticle cover or the reticle into proximity with the component so as to cause the contact surface to adhere to the component and remain adhered without the application of external force, wherein the component is a support structure comprising a main body having a main body surface and a plurality of burls projecting from the main body surface and each having a distal end surface configured to engage with the protective reticle cover or the reticle, and wherein the protective reticle cover is arranged to cover the burls, and wherein the protective reticle cover or the reticle has a coating comprising a plurality of thin-film electrets to form an attractive force between the component and the protective reticle cover or the reticle. ### Claim 2 (depends on 1) The method of claim 1, wherein the coating is a non-metallic coating. ### Claim 3 (depends on 1) The method of claim 1, wherein the method is carried out as part of an operation of flushing, venting, maintenance, transport or other movement of the lithographic apparatus. ### Claim 4 (depends on 1) The method of claim 1, further comprising removing the protective reticle cover from the component by either: applying a pressure differential across the protective reticle cover; applying a mechanical force to the component; or applying an electrostatic potential to the component so as to repel the protective reticle cover. ### Claim 5 (depends on 4) The method of claim 4, wherein: the removing includes supplying a gas to a region between the burls, the main body surface and the protective reticle cover or the reticle so as to increase a pressure in the region above a pressure outside the region. ### Claim 6 A patterning device comprising: a pattern formed therein that, when irradiated in a lithographic apparatus from a first side, is projected onto a substrate; and a second side, opposed to the first side, that is arranged to adhere to a support structure in the lithographic apparatus when contacted with the support structure, and to remain adhered thereto without the application of external force, the second side having a coating that is configured to adhere to the support structure, wherein the support structure comprises a main body having a main body surface and a plurality of burls projecting from the main body surface and each having a distal end surface configured to engage with the patterning device, and wherein the patterning device is arranged to cover the burls, and wherein the coating comprises a plurality of thin-film electrets to form an attractive force between the patterning device and the support structure to achieve the adhering. ### Claim 7 (depends on 6) A lithographic apparatus comprising the patterning device of claim 6.