# US 12,001,147 B2 · Precision multi-axis photolithography alignment correction using stressor film

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- Number: US 12,001,147 B2
- Document ID: US12001147B2
- Status: Granted
- Kind: B2
- Application number: 17/888,553
- Filed: 2022-08-16
- Published: 2023-05-25
- Granted: 2024-06-04
- Earliest claimed: 2021-11-19
- Assignees: Tokyo Electron Limited
- Applicants: Tokyo Electron Limited
- Inventors: Daniel J. Fulford; Anthony R. Schepis; Mark I. Gardner; Anton J. Devilliers; H. Jim Fulford
- Web page: https://patentgrep.com/patent/US12001147B2

## CPC

- G03F 7/70633: {Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching}
- G03F 7/70625: {Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness}
- G03F 7/70783: {Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Aspects of the present disclosure provide a method for improving overlay alignment of patterning by correcting wafer shape. For example, the method can include receiving a wafer having a working surface with at least partially-fabricated semiconductor devices, and a backside surface opposite to the working surface. The method can also include forming a first stressor film on the backside surface. The first stressor film can modify overlay alignment of the working surface in a first direction across the working surface of the wafer. The method can also include forming one or more first semiconductor structures on the working surface of the wafer. The first semiconductor structures are aligned in the first direction.

## Claims

### Claim 1

A method, comprising:
receiving a wafer having a working surface with a first layer and a second layer formed thereon, and a backside surface opposite to the working surface, a target layer to be formed on the working surface that is aligned with the first layer in a first direction and aligned with the second layer in a second direction different from the first direction;
measuring the wafer, with the first layer and the second layer formed on the working surface, to identify a first bow measurement in the first direction;
forming a first stressor film on the backside surface and modifying an internal stress of the first stressor film in the first direction based on the first bow measurement, the first stressor film modifying overlay alignment of the working surface in the first direction across the working surface of the wafer and including no overlay alignment in the second direction across the working surface of the wafer;
forming a first photoresist layer on the working surface that is aligned with the first layer in the first direction;
performing a first lithographic process on the first photoresist layer to form an intermediate hardmask;
measuring the wafer, with the first layer, the second layer and the intermediate hardmask formed on the working surface and the first stressor film formed on the backside surface, to identify a second bow measurement in the second direction;
forming a second stressor film on the backside surface and modifying an internal stress of the second stressor film in the second direction based on the second bow measurement, the second stressor film modifying, overlay alignment of the working surface in the second direction across the working surface of the wafer and including no overlay alignment in the first direction across the working surface of the wafer;
forming a second photoresist layer on the working surface that is aligned with the second layer in the second direction and covers the intermediate hardmask;
performing a second lithographic process on the second photoresist layer and the intermediate hardmask to form a target hardmask; and
performing a target lithographic process on the working surface to form the target layer.

### Claim 2 (depends on 1)

The method of claim 1, wherein the second direction is rotated at least 15 degrees relative to the first direction.

### Claim 3 (depends on 2)

The method of claim 2, wherein the second direction is rotated 45 degrees relative to the first direction.

### Claim 4 (depends on 2)

The method of claim 2, wherein the second direction is orthogonal to the first direction.

### Claim 5 (depends on 1)

The method of claim 1, further comprising:
subsequent to performing the first lithographic process on the first photoresist layer to form the intermediate hardmask, forming one or more first semiconductor structures on the working surface of the wafer, the first semiconductor structures aligned in the first direction.

### Claim 6 (depends on 5)

The method of claim 5, wherein the first stressor film and the second stressor film are formed in a litho-etch-litho-etch (LELE) process or a litho-freeze-litho-etch (LFLE) process.

### Claim 7 (depends on 1)

The method of claim 1, wherein the first stressor film is formed using direct write patterning.