# US 12,000,047 B2 · Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,000,047 B2 - Document ID: US12000047B2 - Status: Granted - Kind: B2 - Application number: 18/163,828 - Filed: 2023-02-02 - Published: 2023-06-08 - Granted: 2024-06-04 - Earliest claimed: 2016-12-14 - Assignees: Lam Research Corporation - Applicants: Lam Research Corporation - Inventors: Rachel E. Batzer; Huatan Qiu; Bhadri N. Varadarajan; Patrick Girard Breiling; Bo Gong; Will Schlosser; Zhe Gui; Taide Tan; Geoffrey Hohn - Web page: https://patentgrep.com/patent/US12000047B2 ## CPC - C23C 16/45565: {Shower nozzles} - C23C 16/45572: {Cooled nozzles} - C23C 16/505: using radio frequency discharges - H01J 37/32082: {Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence)} - H01J 37/32357: {Generation remote from the workpiece, e.g. down-stream} - H01J 37/32422: {Arrangement for selecting ions or species in the plasma} - H01J 37/3244: {Gas supply means} - H01J 37/32522: {Temperature} - H01J 37/32715: {Workpiece holder} - H10P 72/04: {Apparatus for manufacture or treatment} - H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)} - H10P 72/0468: {comprising a chamber adapted to a particular process} - H10P 72/7611: {characterised by edge profile or support profile} - H10P 72/7612: {characterised by lifting arrangements, e.g. lift pins} - H10P 72/7616: {characterised by a coating, a hardness or a material} - H10P 72/7624: {characterised by the mechanical construction of the susceptor, stage or support} - B05C 13/02: for particular articles - C23C 16/4581: {characterised by material of construction or surface finish of the means for supporting the substrate} - C23C 16/4583: {the substrate being supported substantially horizontally} - H01J 37/32642: {Focus rings} - H01J 2237/334: Etching - H10P 72/0421: {for drying etching} - H10P 72/0448: {Apparatus for applying a liquid, a resin, an ink or the like} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B05C: APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (spraying apparatus, atomising apparatus, nozzles B05B; plant for applying liquids or other fluent materials to objects by electrostatic spraying B05B5/08) ## Abstract A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum. ## Claims ### Claim 1 An apparatus for use in processing substrates, the apparatus comprising: a showerhead formed by a plurality of layers that are bonded together to form a contiguous structure, wherein: the showerhead includes a plurality of through-holes extending from a top surface of the showerhead to a bottom surface of the showerhead opposite the top surface, the showerhead includes a secondary gas plenum located in between the top surface of the showerhead and the bottom surface of the showerhead, a plurality of secondary gas injection ports lead from the secondary gas plenum to the bottom surface of the showerhead, a cylindrical wall encircles the through-holes and the plurality of secondary gas injection ports, extends from the bottom surface of the showerhead by a first distance, and is offset radially inward from an outer edge of the showerhead. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the cylindrical wall and the plurality of layers form a contiguous structure. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the secondary gas injection ports protrude outward from the bottom surface of the showerhead by a second distance that is less than the first distance. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein a portion of the showerhead that is radially outward of the cylindrical wall is thicker than a portion of the showerhead that is radially inward of the cylindrical wall. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein: the showerhead further includes a heat transfer fluid plenum that is also interposed between the top surface of the showerhead and the bottom surface of the showerhead, and the heat transfer fluid plenum has a plurality of walls, each wall encircling one of the through-holes and sealing the through-hole from the heat transfer plenum. ### Claim 6 (depends on 5) The apparatus of claim 5, wherein: the showerhead further includes a heat transfer fluid inlet and a heat transfer fluid outlet, and the heat transfer fluid inlet and the heat transfer fluid outlet are both connected with the heat transfer fluid plenum. ### Claim 7 (depends on 5) The apparatus of claim 5, wherein the plurality of layers includes a top layer, a middle layer, and a bottom layer. ### Claim 8 (depends on 7) The apparatus of claim 7, wherein a bottom surface of the top layer partially or fully defines the heat transfer fluid plenum. ### Claim 9 (depends on 8) The apparatus of claim 8, wherein a top surface of the bottom layer partially or fully defines the secondary gas plenum. ### Claim 10 (depends on 7) The apparatus of claim 7, wherein a top surface of the bottom layer partially or fully defines the secondary gas plenum. ### Claim 11 (depends on 5) The apparatus of claim 5, wherein: the heat transfer fluid plenum includes a first arcuate plenum and a second arcuate plenum, a plurality of flow channels extend between the first arcuate plenum and the second arcuate plenum, and the flow channels are arranged side-by-side and extend along parallel directions. ### Claim 12 (depends on 11) The apparatus of claim 11, wherein each flow channel follows a sinusoidal or square-wave path. ### Claim 13 (depends on 11) The apparatus of claim 11, further comprising: a first plurality of posts distributed along a first arcuate path within the first arcuate plenum, and a second plurality of posts distributed along a second arcuate path within the second arcuate plenum. ### Claim 14 (depends on 5) The apparatus of claim 5, wherein: the heat transfer fluid plenum includes a fluid inlet plenum and a plurality of flow channels, the flow channels each follow a corresponding path that leads from a first end that connects with the fluid inlet plenum to a second end that terminates at a corresponding via, at least some of the paths extend along a first direction across the showerhead before reversing to extend along a second direction opposite the first direction, and the vias connect with a fluid outlet plenum located at a different elevation than the fluid inlet plenum. ### Claim 15 (depends on 14) The apparatus of claim 14, wherein the fluid inlet plenum and the fluid outlet plenum are both arcuate in shape. ### Claim 16 (depends on 14) The apparatus of claim 14, wherein at least some of the vias have different cross-sectional areas. ### Claim 17 (depends on 15) The apparatus of claim 15, wherein at least some of the paths are sinusoidal or square-wave. ### Claim 18 (depends on 15) The apparatus of claim 15, wherein the fluid inlet plenum and the fluid outlet plenum are aligned with each other when viewed along a direction perpendicular to the bottom surface of the showerhead. ### Claim 19 (depends on 1) The apparatus of claim 1, further comprising: a processing chamber; and a substrate support, wherein the showerhead is positioned above the substrate support. ### Claim 20 (depends on 19) The apparatus of claim 19, wherein the apparatus is configured such that a top surface of the substrate support is positioned above a bottom surface of the cylindrical wall during processing of a substrate in the apparatus.