# US 12,000,043 B2 · Precursor source arrangement and atomic layer deposition apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 12,000,043 B2 - Document ID: US12000043B2 - Status: Granted - Kind: B2 - Application number: 17/622,316 - Filed: 2020-06-26 - Published: 2022-08-04 - Granted: 2024-06-04 - Earliest claimed: 2019-06-28 - Assignees: Beneq Oy - Applicants: Beneq Oy - Inventors: Pekka Soininen; Hulda Aminoff; Pekka J. Soininen; Ville Miikkulainen - Web page: https://patentgrep.com/patent/US12000043B2 ## CPC - C23C 16/45544: {characterized by the apparatus} - C23C 16/4485: {by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence)} - C23C 16/45527: {characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations} - C23C 16/45561: {Gas plumbing upstream of the reaction chamber} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A precursor source arrangement for an atomic layer deposition reactor and to an atomic layer deposition apparatus wherein the precursor source arrangement includes a valve chamber having one or more supply valves, and a precursor source chamber having a precursor container space inside the precursor source chamber. The precursor source chamber includes a precursor source heat transfer element arranged to heat the precursor container inside the precursor container space. The valve chamber includes a valve chamber heat transfer element arranged to heat the one or more valves inside the valve chamber, and the valve chamber heat transfer element is arranged in heat transfer contact with the precursor source heat transfer element. ## Claims ### Claim 1 A precursor source arrangement for an atomic layer deposition reactor for receiving a precursor container, wherein the precursor source arrangement comprises: a valve chamber including one or more valves; a precursor source chamber having a precursor container space inside the precursor source chamber for receiving the precursor container; a precursor source heat transfer element positioned at least partially within the precursor source chamber and arranged to heat the precursor container inside the precursor container space; and a valve chamber heat transfer element positioned at least partially within the valve chamber and arranged to heat the one or more valves inside the valve chamber, wherein the valve chamber heat transfer element and the precursor source heat transfer element are arranged in contact with each other such that the valve chamber heat transfer element is arranged in heat transfer contact with the precursor source heat transfer element and arranged to transfer thermal energy from the valve chamber towards the precursor source chamber. ### Claim 2 (depends on 1) The precursor source arrangement according to claim 1, wherein: the precursor source chamber includes a precursor source heater arranged to heat the precursor source heat transfer element and the valve chamber comprises a valve chamber heater arranged to heat the valve chamber heat transfer element; or the precursor source chamber includes a precursor source heater arranged to heat the precursor source heat transfer element; or the valve chamber comprises a valve chamber heater arranged to heat the valve chamber heat transfer element. ### Claim 3 (depends on 1) The precursor source arrangement according to claim 1, wherein: the precursor source chamber is a gas tight chamber; or the precursor source chamber and the valve chamber are separate gas tight chambers. ### Claim 4 (depends on 1) The precursor source arrangement according to claim 1, wherein: the valve chamber heat transfer element is arranged to extend from the valve chamber to the precursor source chamber; or the precursor source heat transfer element is arranged to extend from the precursor source chamber and to the valve chamber. ### Claim 5 (depends on 1) The precursor source arrangement according to claim 1, wherein: the valve chamber heat transfer element and the precursor source heat transfer element are arranged in the precursor source chamber; or the valve chamber heat transfer element and the precursor source heat transfer element are arranged in the valve chamber. ### Claim 6 (depends on 1) The precursor source arrangement according to claim 1, wherein: the precursor source heat transfer element is provided on an inner surface of the precursor source chamber; or the precursor source heat transfer element is provided as an inner lining on the inner surface of the precursor source chamber. ### Claim 7 (depends on 1) The precursor source arrangement according to claim 1, wherein: the precursor source heat transfer element is arranged to extend in a height direction of the precursor source chamber or in a vertical direction in the precursor source chamber; or the precursor source heat transfer element is arranged to extend in the precursor source chamber in a direction between a bottom and an upper end of the precursor container space; or the precursor source heat transfer element is arranged to extend in the precursor source chamber from a bottom of the precursor container space to the upper end of the precursor source space. ### Claim 8 (depends on 1) The precursor source arrangement according to claim 1, wherein: the valve chamber heat transfer element is provided as a heat transfer plate in the valve chamber; or the valve chamber heat transfer element is provided on a bottom of the valve chamber inside the valve chamber; or the valve chamber heat transfer element is provided as a bottom plate inside the valve chamber. ### Claim 9 (depends on 1) The precursor source arrangement according to claim 1, wherein: the valve chamber heat transfer element is arranged to extend in horizontal direction or in a direction transverse to a vertical direction; or the valve chamber heat transfer element is arranged to extend perpendicularly or transversely to the precursor source heat transfer element. ### Claim 10 (depends on 1) The precursor source arrangement according to claim 1, wherein: the valve chamber heat transfer element connected to an upper end of the precursor source heat transfer element; or the precursor source heat transfer element is arranged to extend in a vertical direction and the valve chamber heat transfer element is arranged to extend in a horizontal direction, and that the valve chamber heat transfer element is connected to upper end of the precursor source heat transfer element; or an upper end of the precursor source heat transfer element is connected to the valve chamber heat transfer element; or the precursor source heat transfer element is arranged to extend in the vertical direction and the valve chamber heat transfer element is arranged to extend in the horizontal direction, and that upper end of the precursor source heat transfer element is connected to the valve chamber heat transfer element. ### Claim 11 (depends on 1) The precursor source arrangement according to claim 1, wherein the precursor source arrangement comprises a first precursor supply conduit extending from the precursor source chamber to the valve chamber, and that: the precursor source arrangement includes a support member arranged in heat transfer connection with the valve chamber heat transfer element, the first precursor supply conduit being supported to the support member for transferring thermal energy from the valve chamber heat transfer element to the first precursor supply conduit; or the precursor source arrangement comprises a first support member arranged in heat transfer connection with the valve chamber heat transfer element inside the precursor source chamber, the first precursor supply conduit being supported to the first support member for transferring thermal energy from the valve chamber heat transfer element to the first precursor supply conduit. ### Claim 12 (depends on 1) The precursor source arrangement according to claim 1, wherein the precursor source chamber and the valve chamber are arranged against each other, a lead-through being provided between the against each other arranged precursor source chamber and valve chamber, and that the precursor source arrangement comprises the first precursor supply conduit extending from the precursor source chamber to the valve chamber via the lead-through, and that: the lead-through includes a second support member arranged in heat transfer connection with the valve chamber heat transfer element, the first precursor supply conduit being supported to the second support member for transferring thermal energy from the valve chamber heat transfer element to the first precursor supply conduit; or the precursor source arrangement comprises the first support member arranged in heat transfer connection with the valve chamber heat transfer element inside the precursor source chamber and the lead-through comprises a second support member arranged in heat transfer connection with the valve chamber heat transfer element, the first precursor supply conduit being supported to the first and second support members for transferring thermal energy from the valve chamber heat transfer element to the first precursor supply conduit. ### Claim 13 (depends on 1) The precursor source arrangement according to claim 1, wherein the precursor source chamber comprises an upper precursor source space provided inside the precursor source chamber and above the precursor container space, and that: the precursor source arrangement comprises a first precursor supply conduit extending from the precursor source chamber to the valve chamber, the first precursor supply conduit being arranged to extend via the upper precursor source space to the valve chamber; or the precursor source arrangement comprises the first precursor supply conduit extending from the precursor source chamber to the valve chamber and the first support member arranged in heat transfer connection with the valve chamber heat transfer element inside the upper precursor source space, the first precursor supply conduit being arranged to extend via the upper precursor source space to the valve chamber and being supported to the first support member for transferring thermal energy from the valve chamber heat transfer element to the first precursor supply conduit. ### Claim 14 (depends on 1) The precursor source arrangement according to claim 1, wherein the valve chamber heat transfer element is arranged to extend from the valve chamber to the precursor source chamber and the precursor source arrangement comprises a first precursor supply conduit extending from the precursor source chamber to the valve chamber above the valve chamber heat transfer element. ### Claim 15 (depends on 1) The precursor source arrangement according to claim 1, wherein the one or more valves are attached to the valve chamber heat transfer element inside the valve chamber. ### Claim 16 (depends on 1) The precursor source arrangement according to claim 1, wherein the valve chamber comprises a precursor supply connection arranged to a valve chamber wall, and a second precursor supply conduit extending from the valve to the precursor supply connection, the precursor supply connection being arranged in vertical direction above the valve in the valve chamber. ### Claim 17 (depends on 1) The precursor source arrangement according to claim 1, wherein the precursor source arrangement comprises a precursor source casing surrounding the precursor source chamber and the valve chamber, the precursor source chamber and the valve chamber being arranged inside the precursor source casing, and the precursor source casing comprising a ventilation inlet and a ventilation outlet for ventilating the inside of the precursor source casing. ### Claim 18 (depends on 17) The precursor source arrangement according to claim 17, wherein: the ventilation outlet is provided in a vertical direction above the ventilation inlet inside the precursor source casing; or the ventilation inlet is arranged in a vertical direction below the precursor source chamber, and the ventilation outlet is provided in the vertical direction above the ventilation inlet inside the precursor source casing; or the ventilation outlet is provided in the vertical direction above valve chamber and in the vertical direction above the ventilation inlet (inside the precursor source casing; or the ventilation inlet is arranged in the vertical direction below the precursor source chamber, and the ventilation outlet is provided in the vertical direction above the valve chamber, and the ventilation outlet is provided in the vertical direction above the ventilation inlet inside the precursor source casing. ### Claim 19 (depends on 1) The precursor source arrangement according to claim 1, wherein the precursor source arrangement comprises a first precursor source chamber connected to the valve chamber and a second precursor source chamber connected to the valve chamber, the first and second precursor source chamber being at a distance from each other such that a flow gap is provided between the first and second precursor source chamber for ventilation gas flow. ### Claim 20 (depends on 1) An atomic layer deposition apparatus for processing a substrate according to principles of atomic layer deposition method, the apparatus comprising: a vacuum chamber; a reaction chamber inside the vacuum chamber; a process heater arranged inside the vacuum chamber for heating the reaction chamber inside the vacuum chamber; a precursor source arrangement; a lead-through connection provided to and extending from the vacuum chamber between the vacuum chamber and the precursor source arrangement; and a second precursor supply conduit extending from the precursor source arrangement inside the vacuum chamber via the lead-through connection, wherein: the precursor source arrangement is a precursor source arrangement according to claim 1; the precursor source arrangement comprises a precursor supply connection; the second precursor supply conduit is connected to the precursor supply connection; and the precursor supply connection is connected to the lead-through connection. ### Claim 21 (depends on 1) The precursor source arrangement according to claim 1, further including a heat transfer block disposed within the precursor source chamber, in contact with the valve chamber heater transfer element, and spaced from the valve chamber. ### Claim 22 (depends on 1) The precursor source arrangement according to claim 1, wherein at least a portion of the valve chamber heat transfer element is positioned outside of the precursor source chamber. ### Claim 23 (depends on 1) The precursor source arrangement according to claim 1, wherein at least a portion of the valve chamber is spaced from precursor source chamber.