Area selective nanoscale-thin layer deposition via precise functional group lithography
AssigneeThe Curators of the University of Missouri
InventorsMatthew R. Maschmann, Matthias J. Young
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Abstract
A method of depositing a nanoscale-thin film onto a substrate is disclosed. The method generally comprises depositing a layer of a solid or gaseous state functionalizing molecule onto or adjacent to the first surface of the substrate and exposing the first surface to a source of ionizing radiation, thereby functionalizing the first surface of the substrate. Once the layer of functionalizing molecule is removed, a nanoscale-thin film is then deposited onto the functionalized first surface of the substrate.
Claims19
A method of depositing a nanoscale-thin film in a preselected area on a substrate, the method comprising:
- depositing a layer of a functionalizing molecule onto or adjacent to a first surface of the substrate;
- functionalizing the first surface of the substrate by focusing a source of ionizing radiation onto the layer of the functionalizing molecule to create a desired pattern of functionality with nano-scale spatial resolution on the substrate;
- removing the layer of the functionalizing molecule;
- and
- depositing a nanoscale-thin film onto the functionalized first surface of the substrate to form a deposited nanoscale-thin film.
Dependencies are inferred from the claim text.