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US 11,996,259 B2Granted
Patterned x-ray emitting target
AssigneeNova Measuring Instruments Ltd.
InventorsDavid A. Reed, Bruce H. Newcome, Bruno W. Schueler
Life of this patent
Estimating the term…
Abstract
The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.
Claims16
An X-ray metrology system comprising:
- an X-ray source for generating an X-ray beam, said X-ray source including:
- an electron gun that is configured to generate an electron beam;
- and
- a patterned X-ray emitting target that comprises:
- an X-ray blocking mask that comprises one or more openings;
- one or more structural elements positioned below the X-ray blocking mask and comprising an X-ray generating structural element;
- the one or more structural elements comprise a top structural element;
- wherein the X-ray generating structural element is configured to (a) receive electrons of the electron beam that pass through the X-ray blocking mask, and (b) reflect, through the X-ray blocking mask, the X-ray beam;
- a sample holder positioning a sample having a periodic structure;
- a monochromator positioned between said X-ray source and said sample holder such that said X-ray beam travels from said X-ray source to said monochromator and then to said sample holder;
- and
- a detector for collecting at least a portion of an X-ray beam scattered by said sample.
9 more elements
Dependencies are inferred from the claim text.