# US 11,994,556 B2 · Probe position monitoring structure and method of monitoring position of probe > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 11,994,556 B2 - Document ID: US11994556B2 - Status: Granted - Kind: B2 - Application number: 18/205,571 - Filed: 2023-06-05 - Published: 2023-10-05 - Granted: 2024-05-28 - Earliest claimed: 2020-09-02 - Assignees: United Semiconductor Japan Co., Ltd. - Applicants: United Semiconductor Japan Co., Ltd. - Inventors: Yasunobu Torii - Web page: https://patentgrep.com/patent/US11994556B2 ## CPC - G01R 31/2884: {using dedicated test connectors, test elements or test circuits on the IC under test (G01R31/2855 takes precedence)} - G01R 31/2891: {related to sensing or controlling of force, position, temperature (G01R31/2874 takes precedence; sensing of force G01L; sensing of position G01B, G01D; sensing of temperature G01K; controlling in general G05)} - G01B 7/003: {for measuring position, not involving coordinate determination (coordinate measuring G01B7/004)} - G01R 1/07307: {with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card} - G01R: MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES (indicating correct tuning of resonant circuits H03J3/12) - G01B: MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ## Abstract A probe position monitoring structure includes a first common line and a contact portion configured for being directly contacted with a probe. The contact portion includes a first zigzag structure, and a first end of the first zigzag structure is directly connected with the first common line. A method of monitoring a position of a probe includes the following steps. The probe position monitoring structure is provided. The first zigzag structure is directly contacted with a first probe. A resistance measurement is performed to measure a resistance of a portion of the first zigzag structure located between the first probe and the first end for monitoring a position of the first probe. ## Claims ### Claim 1 A probe position monitoring structure, comprising: a first common line; a second common line; and a contact portion configured for being directly contacted with probes, wherein the contact portion comprises: a first zigzag structure, wherein a first end of the first zigzag structure is directly connected with the first common line, and the first zigzag structure is extending in a horizontal direction for being directly contacted with a first probe in a vertical direction; a second zigzag structure, wherein a first end of the second zigzag structure is directly connected with the first common line, a second end of the second zigzag structure is directly connected with the second common line, and the second zigzag structure is extending in the horizontal direction for being directly contacted with a second probe in the vertical direction; and a third zigzag structure, wherein a first end of the third zigzag structure is directly connected with the second common line, and the third zigzag structure is extending in the horizontal direction for being directly contacted with a third probe in the vertical direction. ### Claim 2 (depends on 1) The probe position monitoring structure according to claim 1, wherein the first zigzag structure comprises: first sections, wherein each of the first sections is elongated in a first direction; and second sections, wherein each of the second sections is elongated in a second direction different from the first direction and directly connected with two of the first sections located adjacent to each other. ### Claim 3 (depends on 2) The probe position monitoring structure according to claim 2, wherein a width of each of the first sections is less than a width of the first common line. ### Claim 4 (depends on 3) The probe position monitoring structure according to claim 3, wherein a ratio of the width of the first common line to the width of each of the first sections ranges from 5 to 200. ### Claim 5 (depends on 1) The probe position monitoring structure according to claim 1, wherein a pattern of the second zigzag structure is identical to a pattern of the first zigzag structure. ### Claim 6 (depends on 5) The probe position monitoring structure according to claim 5, wherein a pattern of the third zigzag structure is identical to the pattern of the first zigzag structure. ### Claim 7 (depends on 1) The probe position monitoring structure according to claim 1, further comprising: an interlayer dielectric, wherein the first common line, the second common line, and the contact portion are at least partially disposed in the interlayer dielectric, and the first zigzag structure comprises a first layer and a second layer separated from each other by a portion of the interlayer dielectric. ### Claim 8 (depends on 1) The probe position monitoring structure according to claim 1, wherein the first zigzag structure, the second zigzag structure, the third zigzag structure, the first common line, and the second common line are different parts of a metal layer. ### Claim 9 A method of monitoring a position of a probe, comprising: providing a probe position monitoring structure, wherein the probe position monitoring structure comprises: a first common line; a second common line; and a contact portion, wherein the contact portion comprises: a first zigzag structure, wherein a first end of the first zigzag structure is directly connected with the first common line, and the first zigzag structure is extending in a horizontal direction; a second zigzag structure, wherein a first end of the second zigzag structure is directly connected with the first common line, a second end of the second zigzag structure is directly connected with the second common line, and the second zigzag structure is extending in the horizontal direction; and a third zigzag structure, wherein a first end of the third zigzag structure is directly connected with the second common line, and the third zigzag structure is extending in the horizontal direction; directly contacting the first zigzag structure extending in the horizontal direction with a first probe in a vertical direction; directly contacting the second zigzag structure extending in the horizontal direction with a second probe in the vertical direction; directly contacting the third zigzag structure extending in the horizontal direction with a third probe in the vertical direction; and performing a resistance measurement to measure a resistance of a portion of the first zigzag structure located between the first probe and the first end of the first zigzag structure, a resistance of a portion of the second zigzag structure located between the second probe and the first end of the second zigzag structure, a resistance of a portion of the second zigzag structure located between the second probe and the second end of the second zigzag structure, and a resistance of a portion of the third zigzag structure located between the third probe and the first end of the third zigzag structure. ### Claim 10 (depends on 9) The method of monitoring the position of the probe according to claim 9, further comprising: calculating a length of the portion of the first zigzag structure located between the first probe and the first end of the first zigzag structure according to a result of the resistance measurement. ### Claim 11 (depends on 9) The method of monitoring the position of the probe according to claim 9, wherein the resistance measurement comprises a two-point measurement step via the first probe and the second probe and another two-point measurement step via the second probe and the third probe. ### Claim 12 (depends on 9) The method of monitoring the position of the probe according to claim 9, wherein the first zigzag structure comprises: first sections, wherein each of the first sections is elongated in a first direction; and second sections, wherein each of the second sections is elongated in a second direction different from the first direction and directly connected with two of the first sections located adjacent to each other. ### Claim 13 (depends on 12) The method of monitoring the position of the probe according to claim 12, wherein a width of each of the first sections is less than a width of the first common line. ### Claim 14 (depends on 13) The method of monitoring the position of the probe according to claim 13, wherein a ratio of the width of the first common line to the width of each of the first sections ranges from 5 to 200. ### Claim 15 (depends on 9) The method of monitoring the position of the probe according to claim 9, wherein a pattern of the second zigzag structure is identical to a pattern of the first zigzag structure. ### Claim 16 (depends on 15) The method of monitoring the position of the probe according to claim 15, wherein a pattern of the third zigzag structure is identical to the pattern of the first zigzag structure. ### Claim 17 (depends on 9) The method of monitoring the position of the probe according to claim 9, wherein the probe position monitoring structure further comprises: an interlayer dielectric, wherein the first common line, the second common line and the contact portion are at least partially disposed in the interlayer dielectric, and the first zigzag structure comprises a first layer and a second layer separated from each other by a portion of the interlayer dielectric. ### Claim 18 (depends on 9) The method of monitoring the position of the probe according to claim 9, wherein the first zigzag structure, the second zigzag structure, the third zigzag structure, the first common line, and the second common line are different parts of a metal layer.