Heat-sensitive recording material
AssigneePapierfabrik August Koehler SE
InventorsMichael Horn, Kerstin Zieringer
Life of this patent
Estimating the term…
Abstract
The invention relates to a color developer of the formula (I), wherein m and n independently of one another are ≥1, Ar1 is an unsubstituted or substituted (hetero) aromatic radical, Ar2 is an unsubstituted or substituted phenyl radical, and Y is at least one (m+n)-times substituted benzene or naphthalene group, and to a heat-sensitive recording material, comprising a supporting substrate and a heat-sensitive color-forming layer containing at least one color former and at least one phenol-free color developer, wherein the at least one color developer is the compound of the formula (I). The invention further relates to a method for producing said heat-sensitive recording material.
Claims10
Heat-sensitive recording material comprising a supporting substrate as well as a heat-sensitive color-forming layer containing at least one color former and at least one phenol-free color developer, wherein the at least one color developer is the compound of the formula (I)
- wherein m and n independently of one another are ≥1, Ar1 is an unsubstituted phenyl radical or a monosubstituted phenyl radical substituted with a C1-05-alkyl radical, an alkenyl radical, an alkinyl radical, a benzyl radical, an RO radical, a halogen radical, an ROC radical, an RO2C radical, a CN radical, an NO2 radical, an R—SO2O radical, an RO—SO2 radical, an R—NH—SO2 radical, an R—SO2NH radical, an R—NH—CO—NH radical, an R—SO2-NH—CO—NH radical, an R—NH—CO—NH—SO2 radical or an R—CO—NH radical, wherein R is a C1-05-alkyl radical, an alkenyl radical, an alkinyl radical, a phenyl radical, a tolyl radical or a benzyl radical, Ar2 is an unsubstituted phenyl radical or a monosubstituted phenyl radical or a phenyl radical substituted with a C1-C4 alkyl radical, and Y is at least one (m+n)-times substituted benzene or naphthalene group, wherein (m+n) is 2, 3 or 4 and wherein the compound of formula (1) is selected from N-phenyl-2-(3-(phenylsulfonyl)ureide)benzene sulfonamide;
- N-(4-tolyl)-2-(3-(phenylsulfonyl)ureide)benzene sulfonamide;
- N-(4-methoxyphenyl)-2-(3-(phenylsulfonyl)ureide)benzene sulfonamide;
- methyl 4-(2-(3-(phenylsulfonyl)ureide)phenyl sulfonamide) benzoate;
- N-(3-chlorophenyl)-2-(3-(phenylsulfonyl)ureide) benzene sulfonamide;
- 2-(3-(phenylsulfonyl)ureide)-N-(2-(3-phenylureido)phenyl)benzene sulfonamide;
- N-(2-tolyl)-2-(3-tosylureide)benzene sulfonamide;
- N-(4-tolyl)-2-(3-tosylureide)benzene sulfonamide;
- N-(3-tolyl)-2-(3-tosylureide)benzene sulfonamide;
- N-(4-methoxy-phenyl)-2-(3-tosylureide)benzene sulfonamide;
- methyl 4-(2-(3-tosylureide)phenyl sulfonamide) benzoate;
- N-(3-chlorphenyl)-2-(3-tosylureide)benzene sulfonamide;
- N-(4-chlorphenyl)-2-(3-tosylureide)benzene sulfonamide;
- 3-(2-(3-tosylureide)phenyl sulfonamide)phenyl 4-methyl benzene sulfonate;
- 4-methyl-N-((4-(N-(2-(3-phenylureide)phenyl) sulfamoyl)phenyl)carbamoyl)benzene sulfonamide;
- ethyl 4-(2-(3-tosylureide)phenyl) sulfonamide)benzoate;
- N-(2-(3-phenylureide)phenyl)-3-(3-tosylureide)benzene sulfonamide;
- N-phenyl-4-(3-tosylureide)benzene sulfonamide;
- N-(3-tolyl)-4-(3-tosylureide)benzene sulfonamide;
- methyl 4-(4-(3-tosylureide)phenyl sulfonamide)benzoate;
- N-(4-chlorphenyl)-4-(3-tosylureido)benzene sulfonamide;
- 4-methyl-N-((4-(N-(4-(3-phenylureide)phenyl)sulfamoyl)phenyl)carbamoyl)benzene sulfonamide;
- ethyl 4-(4-(3-tosylureide)phenyl sulfonamide)benzoate;
- N,N′-(((4-(N-phenyl sulfamoyl)-1,3-phenylene)bis(azanediyl))bis(carbonyl))bis(4-methyl benzene sulfonamide);
- N1,N3-diphenyl-4,6-bis(3-(phenyl sulfonyl)ureide)benzene-1,3-disulfonamide;
- N1,N3-diphenyl-4,6-bis(3-tosylureide)benzene-1,3-disulfonamide;
- diethyl 4-4′-((4,6-bis(3-tosylureide)-1,3-phenylene disulfonyl)bis(azanediyl))dibenzoate;
- and combinations thereof.
Dependencies are inferred from the claim text.