Method for measuring concentration of fluorine gas in halogen fluoride-containing gas using mass spectrometer
AssigneeResonac Corporation
InventorAtsushi Suzuki
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Abstract
A method for measuring the concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer, the method including, before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.
Claims9
A method for measuring a concentration of fluorine gas (F2) contained in a halogen fluoride-containing gas by using an analysis apparatus having a halogen fluoride-containing gas supply source, a fluorine-containing gas supply source, a tube, a capillary, and a mass spectrometer,
- the method comprising:
- before measuring the concentration of fluorine gas, performing passivation treatment on the tube and the capillary by using a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.
An apparatus for measuring a concentration of fluorine gas, the apparatus comprising:
- a halogen fluoride-containing gas supply source;
- a fluorine-containing gas supply source;
- a tube;
- a capillary;
- and
- a mass spectrometer,
- wherein the tube and the capillary have been subjected to passivation treatment with a passivation gas containing a fluorine-containing gas supplied from the fluorine-containing gas supply source.
Dependencies are inferred from the claim text.