Method for testing interfacial tribochemical reaction between abrasive and diamond wafer

A method for testing an interfacial tribochemical reaction between abrasive and a diamond wafer, comprising:

• (1) coating a layer of active metal abrasive or a layer of metal oxide abrasive on a tip surface of a diamond indenter of a nano scratch tester by magnetron sputtering;
• (2) installing the diamond indenter with the layer of the active metal abrasive or the layer of the metal oxide abrasive on the nano scratch tester, and scratching a surface of the diamond wafer using the diamond indenter with the layer of the active metal abrasive or the layer of the metal oxide abrasive and deionized water having a temperature of 40-90° C. to enable the surface of the diamond wafer to react with the active metal abrasive or the metal oxide abrasive, and obtaining a scratched diamond wafer;
• and
• (3) putting the scratched diamond wafer on a scanning probe micro Raman spectrometer, and analyzing chemical components of a scratching section of the scratched diamond wafer.