Chemical supply apparatus, method for removing particles from chemical, nozzle unit, and substrate treating apparatus

A nozzle unit comprising:

• a body having a supply channel defined therein through which chemical is supplied;
• and
• an electrode received in the supply channel,
• wherein the electrode is connected to a ground line or a power supply,
• wherein the electrode is embodied as a disk extending in a perpendicular manner to a length direction of the supply channel and holes or slits are formed in the disk and in a flow path direction to allow the chemical to pass therethrough.

A substrate treating apparatus comprising:

• an evaporation unit disposed downstream of a chemical supply source to vaporize supplied chemical thereto;
• a filter unit disposed downstream of the evaporation unit, wherein the filter unit filters impurities in the vaporized chemical while the vaporized chemical passes through the filter unit;
• a liquefaction unit disposed downstream of the filter unit to liquefy the vaporized chemical;
• a chemical storage tank disposed downstream of the liquefaction unit to store the liquefied chemical therein;
• an electrode disposed at least in the evaporation unit, wherein the electrode electrically reacts with the chemical or particles in the chemical to change electrical properties of the chemical or the particles;
• a container having a treating space defined therein;
• a support unit disposed in the treating space to support a substrate thereon;
• and
• a nozzle unit disposed downstream of the liquefaction unit and in fluid communication with the liquefaction unit, wherein the nozzle unit supplies the chemical onto the substrate supported on the support unit,
• wherein the nozzle unit includes:
• a body having a supply channel defined therein through which the chemical is supplied;
• and
• an other electrode received in the supply channel,
• wherein the other electrode of the nozzle unit is connected to a ground line or a power supply.