Back to results
US 11,978,608 B2Granted
Ion generation device and ion generation method
AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorYuuji Ishida
Life of this patent
Estimating the term…
Abstract
There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.
Claims15
An ion generation device comprising:
- a vacuum chamber;
- an arc chamber disposed inside the vacuum chamber, wherein the arc chamber defines a plasma generation chamber in which a plasma is generated and has a slit for extracting an ion from the plasma generation chamber;
- and
- a heating device that includes a laser beam source disposed outside the vacuum chamber, wherein the laser beam source is configured to heat the plasma generation chamber by irradiating an outer surface of the arc chamber with a laser beam emitted from the laser beam source through a vacuum window provided on a wall of the vacuum chamber,
- wherein the vacuum window is configured to be cooled by a fluid flowing through a cooling flow path provided around the vacuum window.
2 more elements
An ion generation method comprising:
- heating a plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to a plasma generated inside the plasma generation chamber with a laser beam;
- extracting an ion from the plasma generated inside the plasma generation chamber;
- and
- monitoring at least one of a state of the plasma generated inside the plasma generation chamber, a temperature of the plasma generation chamber, and an ion current of the extracted ion,
- wherein based on a result of the monitoring, an irradiation condition of the laser beam is variable with respect to a lapse of time, and
- wherein a power of the laser beam is reduced in response to an increase in a density of the plasma generated inside the plasma generation chamber, or in response to an increase in a temperature of the plasma generation chamber.
3 more elements
Dependencies are inferred from the claim text.