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US 11,976,220 B2Granted
Polishing composition and method for producing same
AssigneeFujimi Incorporated
InventorsKohsuke Tsuchiya, Hisanori Tansho, Yusuke Suga, Taiki Ichitsubo, Takayuki Takemoto, Naohiko Saito, Michihiro Kaai
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Abstract
Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.
Claims14
A polishing composition comprising:
- an abrasive;
- a water-soluble polymer;
- a basic compound;
- and
- a reaction product of a polymerization initiator and a polymerization inhibitor, wherein:
- the polymerization initiator is a radical polymerization initiator, wherein the radical polymerization initiator is one or two or more selected from the group consisting of persulfates, water-soluble peroxides, oil-soluble peroxides, water-soluble azo compounds, and oil-soluble azo compounds;
- and
- wherein the reaction product of the polymerization initiator and the polymerization inhibitor is a coupling reaction product of the polymerization initiator and the polymerization inhibitor;
- wherein a content of the reaction product of the polymerization initiator and the polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis, and
- the water-soluble polymer contains 10 mol % or more and 100 mol % or less of a structural unit derived from a monomer containing a nitrogen atom.
7 more elements
A polishing composition comprising:
- an abrasive;
- a water-soluble polymer;
- a basic compound;
- and
- a reaction product of a polymerization initiator and a polymerization inhibitor, wherein the reaction product comprises a coupling reaction product of the polymerization initiator and the polymerization inhibitor or a chain reaction product of the polymerization inhibitor;
- wherein:
- a content of the reaction product of the polymerization initiator and the polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis;
- the water-soluble polymer contains 10 mol % or more and 100 mol % or less of a structural unit derived from a monomer containing a nitrogen atom;
- and
- the water-soluble polymer is a morpholine polymer having a structural unit derived from N-(meth)acryloylmorpholine.
7 more elements
A polishing composition comprising:
- an abrasive;
- a water-soluble polymer;
- a basic compound;
- and
- a reaction product of a polymerization initiator and a polymerization inhibitor, wherein the reaction product comprises a coupling reaction product of the polymerization initiator and the polymerization inhibitor or a chain reaction product of the polymerization inhibitor;
- wherein:
- a content of the reaction product of the polymerization initiator and the polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis;
- the water-soluble polymer contains 10 mol % or more and 100 mol % or less of a structural unit derived from a monomer containing a nitrogen atom;
- and
- the reaction product comprises an aromatic ring derived from the polymerization inhibitor or a hydrophobic moiety derived from a heterocyclic amine.
7 more elements
Dependencies are inferred from the claim text.