Monitoring radical particle concentration using mass spectrometry
AssigneeMKS Instruments, Inc.
InventorsChenglong Yang, Jimmy Liu, James Edward Blessing
Life of this patent
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Abstract
A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.
Claims48
A system for monitoring radical particles comprising:
- a test chamber configured to be coupled to a flow channel adapted to transmit a gas, the test chamber defining an aperture connecting the test chamber and the flow channel, the aperture configured to permit a subset of the gas to enter the test chamber from the flow channel;
- an ionizer positioned within the test chamber, the ionizer configured to generate radical ions from radical particles of the subset of the gas;
- and
- a mass spectrometer configured to measure a quantity of the radical ions.
A method of monitoring radical particles comprising:
- directing a subset of a gas from a flow channel to a test chamber via an aperture connecting the test chamber and the flow channel;
- generating, via an ionizer, radical ions from radical particles of the subset of the gas;
- and
- measuring, via a mass spectrometer, a quantity of the radical ions.
Dependencies are inferred from the claim text.