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US 11,971,144 B2Granted
Processing apparatus and gas supply method
AssigneeTokyo Electron Limited
InventorSeiya Nasu
Life of this patent
Estimating the term…
Abstract
A processing apparatus includes: a processing container configured to accommodate a substrate; a storage tank connected to the processing container via a gas supply pipe; a pressure sensor configured to detect a pressure in the storage tank; a valve provided in the gas supply pipe between the processing container and the storage tank; and a controller configured to control an opening degree of the valve based on the pressure in the storage tank detected by the pressure sensor.
Claims10
A processing apparatus comprising:
- a processing container configured to accommodate a substrate;
- a storage tank connected to the processing container via a gas supply pipe;
- a pressure sensor configured to detect a pressure in the storage tank;
- a valve provided in the gas supply pipe between the processing container and the pressure sensor of the storage tank;
- and a controller configured to control an opening degree of the valve in an open state based on the pressure in the storage tank detected by the pressure sensor to make a drop amount of the pressure in the storage tank become equal to a set discharge pressure of a gas supplied from the storage tank to the processing container through the valve, wherein the controller is configured to control the opening degree of the valve in a first mode for fixing the valve to a constant opening degree, and subsequently control the opening degree of the valve in a second mode for controlling the opening degree of the valve to make the drop amount of the pressure in the storage tank become equal to the set discharge pressure.
2 more elements
A gas supply method comprising:
- storing a gas in a storage tank connected to a processing container via a gas supply pipe;
- and supplying the gas stored in the storage tank into the processing container, wherein a valve is provided in the gas supply pipe between the processing container and a pressure sensor of the storage tank, and in the supplying, the opening degree of the valve in an open state is controlled based on a pressure in the storage tank detected by the pressure sensor, wherein, in the supplying, the opening degree of the valve is controlled to make a drop amount of the pressure in the storage tank become equal to a set discharge pressure of a gas supplied from the storage tank to the processing container through the valve, wherein, in the supplying, the opening degree of the valve is controlled in a first mode for fixing the valve to a constant opening degree, and subsequently, controlled in a second mode for controlling the opening degree of the valve to make the drop amount of the pressure in the storage tank become equal to the set discharge pressure.
Dependencies are inferred from the claim text.