Film vibration device and fabrication method thereof, and cleaning device including the same

A method of fabricating a film vibration device, comprising:

• (S1) forming a circular-hole array on a surface of a silicon wafer by photoetching;
• (S2) etching an aluminum layer on the silicon wafer;
• (S3) etching the silicon wafer to form a through-hole array, so as to obtain a porous silicon wafer;
• (S4) attaching a polyethylene terephthalate (PET) sheet to a side of the porous silicon wafer;
• and subjecting the PET sheet to breakdown with the porous silicon wafer as a mask to obtain a porous PET film;
• (S5) attaching a polyvinylidene fluoride (PVDF) film to a lower side of the porous silicon wafer;
• performing vacuumization above the porous silicon wafer, and simultaneously heating the PVDF film below the porous silicon wafer such that a plurality of dome micro-structures are formed on the PVDF film;
• and
• (S6) laminating the porous PET film on each of two sides of the PVDF film having the plurality of dome micro-structures to obtain the film vibration device;
• wherein in step (S5), the heating is performed through three annealing-cooling operations, each comprising:
• heating a bottom of the PVDF film at 75-85° C. for 4-6 min;
• and cooling the PVDF film to room temperature while keeping vacuum above the PVDF film.