Semiconductor structure having fin structures
AssigneeNanya Technology Corporation
InventorMin-Chung Cheng
Life of this patent
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Abstract
The present disclosure provides a semiconductor structure having a fin structure. The semiconductor includes a substrate defined with an active region. A first gate structure is disposed in the active region and includes a dielectric material. A second gate structure is disposed in the active region and includes the dielectric material. A fin structure having a first top surface is arranged to alternate with the first gate structure and the second gate structure. The first gate structure has a second top surface and the second gate structure has a third top surface. The second top surface and the third top surface are lower than the first top surface.
Claims7
A semiconductor structure, comprising:
- a substrate defined with an active region;
- a first gate structure disposed in the active region;
- a second gate structure disposed in the active region adjacent to the first gate structure;
- and
- a fin structure having a first top surface arranged to alternate with the first gate structure and the second gate structure,
- wherein the first gate structure and the second gate structure each comprises a filled dielectric material to define a second top surface of the first gate structure and a third top surface of the second gate structure respectively;
- wherein the second top surface and the third top surface are lower than the first top surface,
- wherein a width of the first gate structure is smaller than a width of the second gate structure,
- wherein the third top surface is lower than the second top surface, wherein at least one of the second top surface or the third top surface is a non-flat surface.
A semiconductor structure, comprising:
- a substrate defined with an active region;
- a first gate structure disposed in the active region;
- a second gate structure disposed in the active region adjacent to the first gate structure;
- and
- a fin structure having a first top surface arranged to alternate with the first gate structure and the second gate structure,
- wherein the first gate structure and the second gate structure each comprises a filled dielectric material to define a second top surface of the first gate structure and a third top surface of the second gate structure respectively;
- wherein the second top surface and the third top surface are lower than the first top surface,
- wherein a width of the first gate structure is smaller than a width of the second gate structure,
- wherein the third top surface is lower than the second top surface, wherein the second gate structure is deeper than the first gate structure, wherein an opening of first gate structure is smaller than an opening of the second gate structure.
Dependencies are inferred from the claim text.