Pixel structure, image sensor, image capturing apparatus, and electronic device
AssigneeSony Semiconductor Solutions Corporation
InventorTakahiro Miura
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AssigneeSony Semiconductor Solutions Corporation
InventorTakahiro Miura
Estimating the term…
To reduce the influence of generation of after-pulses when a pixel including a SPAD is used. In a SPAD pixel, a PN junction part of a P+ type semiconductor layer and an N+ type semiconductor layer is formed, a P type semiconductor layer having a concentration higher than the concentration of a silicon substrate is formed in a region deeper than the PN junction part and close to a light absorption layer. With no quenching operation generating no after-pulse, electrons generated in the light absorption layer are guided to the PN junction part and subjected to avalanche amplification. When the quenching operation is performed after avalanche amplification, the electrons are guided to the N+ type semiconductor layer by a potential barrier to prevent avalanche amplification. The present disclosure is applicable to an image sensor including a SPAD.
A sensor, comprising:
A light detecting sensor, comprising:
Dependencies are inferred from the claim text.