Display substrate and manufacturing method therefor, and display device

A display substrate, comprising:

• a substrate base;
• and
• an active layer, a gate insulating layer, a first metal film layer, an interlayer insulating layer, a second metal film layer, and a passivation layer stacked successively on the substrate base, wherein the first metal film layer comprises a pattern of a gate and of a gate line;
• the second metal film layer comprises a pattern of a source/drain and of a data line;
• and
• an oxide metal layer;
• wherein an opposite region is defined by the gate line opposite to the data line, the oxide metal layer is on a surface of the opposite region facing the data line, and the gate line and the data line are arranged partially opposite to each other;
• wherein the opposite region comprises:
• an overlap region formed by the gate line and the data line, and two symmetrical first regions beyond the overlap region along an extending direction of the gate line;
• wherein the width of each of the first regions in the extending direction of the gate line is 2 μm to 3 μm;
• wherein the first metal film layer comprises a first molybdenum metal layer, a copper metal layer, an aluminum metal layer and a second molybdenum metal layer successively stacked on a side of the gate insulating layer away from the substrate base;
• the opposite region comprises the first molybdenum metal layer, the copper metal layer and part of the aluminum metal layer;
• and the oxide metal layer is an aluminum oxide formed after the aluminum metal layer is oxidized;
• wherein a thickness of the first molybdenum metal layer ranges from 0.03 μm to 0.04 μm, a thickness of the copper metal layer ranges from 0.4 μm to 0.5 μm, a thickness of the aluminum metal layer ranges from 0.06 μm to 0.08 μm, and a thickness of the second molybdenum metal layer is 0.05 μm.