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US 11,961,748 B2Granted
Support unit and substrate treating apparatus including the same
AssigneeSemes Co., Ltd.
InventorsKangseop Yun, Youngil Lee, Jungbong Choi
Life of this patent
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Abstract
A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.
Claims18
A support apparatus for supporting a substrate, the support apparatus comprising:
- a plurality of heating lamps;
- and
- a reflector,
- wherein the reflector includes a curved surface configured to reflect thermal energy generated by at least one of the heating lamps toward an edge region of the substrate,
- wherein the reflector includes:
- a base disposed under the plurality of heating lamps;
- and
- a protrusion protruding upward from the base,
- wherein the protrusion includes the curved surface,
- wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp,
- and
- wherein the curved surface is configured to face a perimeter of the substrate,
- wherein the protrusion includes:
- a first protrusion including a first curved surface configured to reflect the thermal energy toward a first position on the edge region of the substrate;
- and
- a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.
13 more elements
An apparatus for treating a substrate, the apparatus comprising:
- a support plate configured to support the substrate;
- and
- a liquid supplier configured to dispense a treatment liquid onto the substrate supported on the support plate,
- wherein the support plate includes:
- a chuck configured to support the substrate;
- a plurality of heating lamps configured to emit light to heat the substrate supported on the chuck;
- and
- a reflector,
- wherein the reflector includes a curved surface configured to reflect the light generated by at least one of the heating lamps towards an edge region of the substrate supported on the chuck,
- wherein the reflector includes:
- a base disposed under the heating lamps;
- and
- a protrusion protruding upward from the base,
- wherein the protrusion includes the curved surface,
- wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp, and
- wherein the curved surface is configured to face a perimeter of the substrate,
- wherein the protrusion includes:
- a first protrusion including a first curved surface configured to reflect thermal energy toward a first position on the edge region of the substrate;
- and
- a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.
17 more elements
An apparatus for treating a substrate, the apparatus comprising:
- a support plate configured to support the substrate;
- and
- a liquid supplier configured to dispense a treatment liquid onto the substrate supported on the support plate,
- wherein the support plate includes:
- a chuck configured to support the substrate;
- a plurality of heating lamps provided inside the chuck and configured to emit light to heat the substrate supported on the chuck;
- and
- a reflector configured to reflect the light toward an edge region of the substrate,
- wherein the reflector includes a curved surface configured to form part of a virtual ellipse having a first focal point and a second focal point, when viewed from a front side view of the support plate,
- wherein the reflector includes:
- a base disposed under the plurality of heating lamps;
- and
- a protrusion protruding upward from the base,
- wherein the protrusion includes the curved surface and the curved surface is configured to face a perimeter of the substrate,
- wherein the protrusion is arranged between an outermost heating lamp and an adjacent heating lamp to the outermost heating lamp,
- wherein the first focal point is in agreement with the center of the outermost heating lamp when viewed from the front side view, and
- wherein the second focal point, when viewed from the front side view, overlaps the edge region of the substrate supported on the chuck,
- wherein the protrusion includes:
- a first protrusion including a first curved d surface configured to reflect thermal energy toward a first position on the edge region of the substrate;
- and
- a second protrusion including a second curved surface configured to reflect the thermal energy toward a second position on the edge region of the substrate, the second position being different from the first position.
18 more elements
Dependencies are inferred from the claim text.